High-quality SiO2 film formation by highly concentrated ozone gas at below 600°C

Tetsuya Nishiguchi, Hidehiko Nonaka, Shingo Ichimura, Yoshiki Morikawa, Mitsuru Kekura, Masaharu Miyamoto

Research output: Contribution to journalArticle

46 Citations (Scopus)

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Physics & Astronomy