Highly angular resolved X-ray photoelectron diffraction measurements by using the diffraction plane aperture

Keiji Tamura, Mikiya Amano, Rie Tamura, Susumu Shiraki, Hideshi Ishii, Tatsuo Okano, Masanori Owari, Makoto Doi, Katsumi Tsukamoto, Masami Taguchi, Chuhei Oshima, Takanori Koshikawa, Ryuichi Shimizu, Yoshimasa Nihei

    Research output: Contribution to journalArticle

    Abstract

    We have been carrying out a X-ray Photoelectron Diffraction (XPED) measurements by using a new input-lens-system and a high power X-ray source. In the new input-lens-system, high angle resolution and high throughput are accomplished by placing an aperture not on the image plane but on the diffraction plane of electron optics. The focal position on the diffraction plane has a linear relationship to the emission angle and is independent of kinetic energy. The angular resolution is numerically obtained as a function of the aperture size. A high angular resolution is therefore easily achieved with a small aperture. In the angle-resolving lens system, aperture sizes (Φ4 mm, Φ2 mm, Φ00.5 mm, Φ00.25 mm) correspond to the angular resolutions (±0.6°, ±0.3°, ±0.08°, ±0.04°) respectively. High angle-resolved XPED patterns from Ge(111) are obtained. Detected photoelectron intensities are high enough to measure the PED pattern even if angle resolution is 0.04°. Moreover, fine structure of the PED pattern such as the Kikuchi pattern can be measured clearly.

    Original languageEnglish
    Pages (from-to)407-411
    Number of pages5
    JournalShinku/Journal of the Vacuum Society of Japan
    Volume46
    Issue number5
    Publication statusPublished - 2003

    Fingerprint

    Photoelectrons
    Lenses
    photoelectrons
    Diffraction
    apertures
    X rays
    angular resolution
    diffraction
    Electron optics
    lenses
    x rays
    Kinetic energy
    Diffraction patterns
    electron optics
    Throughput
    diffraction patterns
    kinetic energy
    fine structure
    high resolution

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Surfaces and Interfaces

    Cite this

    Tamura, K., Amano, M., Tamura, R., Shiraki, S., Ishii, H., Okano, T., ... Nihei, Y. (2003). Highly angular resolved X-ray photoelectron diffraction measurements by using the diffraction plane aperture. Shinku/Journal of the Vacuum Society of Japan, 46(5), 407-411.

    Highly angular resolved X-ray photoelectron diffraction measurements by using the diffraction plane aperture. / Tamura, Keiji; Amano, Mikiya; Tamura, Rie; Shiraki, Susumu; Ishii, Hideshi; Okano, Tatsuo; Owari, Masanori; Doi, Makoto; Tsukamoto, Katsumi; Taguchi, Masami; Oshima, Chuhei; Koshikawa, Takanori; Shimizu, Ryuichi; Nihei, Yoshimasa.

    In: Shinku/Journal of the Vacuum Society of Japan, Vol. 46, No. 5, 2003, p. 407-411.

    Research output: Contribution to journalArticle

    Tamura, K, Amano, M, Tamura, R, Shiraki, S, Ishii, H, Okano, T, Owari, M, Doi, M, Tsukamoto, K, Taguchi, M, Oshima, C, Koshikawa, T, Shimizu, R & Nihei, Y 2003, 'Highly angular resolved X-ray photoelectron diffraction measurements by using the diffraction plane aperture', Shinku/Journal of the Vacuum Society of Japan, vol. 46, no. 5, pp. 407-411.
    Tamura, Keiji ; Amano, Mikiya ; Tamura, Rie ; Shiraki, Susumu ; Ishii, Hideshi ; Okano, Tatsuo ; Owari, Masanori ; Doi, Makoto ; Tsukamoto, Katsumi ; Taguchi, Masami ; Oshima, Chuhei ; Koshikawa, Takanori ; Shimizu, Ryuichi ; Nihei, Yoshimasa. / Highly angular resolved X-ray photoelectron diffraction measurements by using the diffraction plane aperture. In: Shinku/Journal of the Vacuum Society of Japan. 2003 ; Vol. 46, No. 5. pp. 407-411.
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