Abstract
The main features of the process are as follows: 1) adoption of epitaxial-growth wafer; 2) bird's beak-reduced LOCOS isolation; 3) highly reliable memory cell capacitor with 10 nm SiO//2; 4) low resistivity TiSi//2 polycide gate electrode; 5) Al-Si-Ti interconnection with low temperature planarization of the underlying layer; and 6) 1. 2- mu m pattern formation by a 5:1 step and repeat aligner followed by reactive ion etching. A highly reliable 1M multiplied by 1 dynamic MOS memory was successfully fabricated.
| Original language | English |
|---|---|
| Pages (from-to) | 647-650 |
| Number of pages | 4 |
| Journal | Technical Digest - International Electron Devices Meeting |
| Publication status | Published - 1984 Dec 1 |
| Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry
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Matsukawa, T., Inuishi, M., Mitsuhashi, J., Hirayama, M., Tsukamoto, K., Uoya, S., Yoshihara, T., & Nakata, H. (1984). HIGHLY RELIABLE N-MOS PROCESS FOR ONE MEGABIT DYNAMIC RANDOM ACCESS MEMORY. Technical Digest - International Electron Devices Meeting, 647-650.