Hyperthermal beam for oxidation and nitridation produced by laser evaporation of mixed O₃/N₂O cryogenic film

We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O₃) and nitrous oxide (N₂O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N₂O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O₃, and surrounding N₂O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.