Hyperthermal beam for oxidation and nitridation produced by laser evaporation of mixed O3/N2O cryogenic film

Tetsuya Nishiguchi, Yoshiki Morikawa, Masaharu Miyamoto, Hidehiko Nonaka, Shingo Ichimura

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O3) and nitrous oxide (N2O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N2O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O3, and surrounding N2O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.

Original languageEnglish
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume40
Issue number8 B
Publication statusPublished - 2001 Aug 15
Externally publishedYes

Fingerprint

Nitridation
Cryogenics
cryogenics
Evaporation
evaporation
Oxidation
oxidation
Molecules
Lasers
Nitric oxide
nitric oxide
lasers
molecules
Photodissociation
Atoms
nitrous oxides
Pulsed lasers
Excited states
ejection
photodissociation

Keywords

  • Laser evaporation
  • Molecular beam
  • Nitric oxide
  • Nitridation
  • Nitrous oxide
  • Oxidation
  • Oxygen atom
  • Ozone
  • Photodissociation

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Hyperthermal beam for oxidation and nitridation produced by laser evaporation of mixed O3/N2O cryogenic film. / Nishiguchi, Tetsuya; Morikawa, Yoshiki; Miyamoto, Masaharu; Nonaka, Hidehiko; Ichimura, Shingo.

In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 40, No. 8 B, 15.08.2001.

Research output: Contribution to journalArticle

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AU - Ichimura, Shingo

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N2 - We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O3) and nitrous oxide (N2O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N2O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O3, and surrounding N2O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.

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