Abstract
We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O3) and nitrous oxide (N2O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N2O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O3, and surrounding N2O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.
| Original language | English |
|---|---|
| Journal | Japanese Journal of Applied Physics, Part 2: Letters |
| Volume | 40 |
| Issue number | 8 B |
| Publication status | Published - 2001 Aug 15 |
| Externally published | Yes |
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Keywords
- Laser evaporation
- Molecular beam
- Nitric oxide
- Nitridation
- Nitrous oxide
- Oxidation
- Oxygen atom
- Ozone
- Photodissociation
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
- Physics and Astronomy(all)
Cite this
Hyperthermal beam for oxidation and nitridation produced by laser evaporation of mixed O3/N2O cryogenic film. / Nishiguchi, Tetsuya; Morikawa, Yoshiki; Miyamoto, Masaharu; Nonaka, Hidehiko; Ichimura, Shingo.
In: Japanese Journal of Applied Physics, Part 2: Letters, Vol. 40, No. 8 B, 15.08.2001.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Hyperthermal beam for oxidation and nitridation produced by laser evaporation of mixed O3/N2O cryogenic film
AU - Nishiguchi, Tetsuya
AU - Morikawa, Yoshiki
AU - Miyamoto, Masaharu
AU - Nonaka, Hidehiko
AU - Ichimura, Shingo
PY - 2001/8/15
Y1 - 2001/8/15
N2 - We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O3) and nitrous oxide (N2O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N2O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O3, and surrounding N2O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.
AB - We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O3) and nitrous oxide (N2O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N2O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O3, and surrounding N2O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.
KW - Laser evaporation
KW - Molecular beam
KW - Nitric oxide
KW - Nitridation
KW - Nitrous oxide
KW - Oxidation
KW - Oxygen atom
KW - Ozone
KW - Photodissociation
UR - http://www.scopus.com/inward/record.url?scp=0035880329&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035880329&partnerID=8YFLogxK
M3 - Article
VL - 40
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
SN - 0021-4922
IS - 8 B
ER -