Abstract
We have performed KrF pulsed-laser evaporation of a cryogenic film consisting of a mixture of ozone (O3) and nitrous oxide (N2O) to obtain an energetically reactive beam for oxidation as well as nitrogen (N) incorporation. The ejection of hyperthermal nitric oxide (NO) molecules as well as hyperthermal oxygen (O) atoms and N2O molecules was observed at a relatively high laser fluence. The generation of additional NO molecules is explained by the chemical reaction between O atoms in the electronically excited state, which are generated from photodissociation of O3, and surrounding N2O molecules during the evaporation process. By applying this beam to Si, we have achieved an extremely high oxidation rate and 4-7 at.% N incorporation even at room temperature.
Original language | English |
---|---|
Pages (from-to) | L897-L899 |
Journal | Japanese Journal of Applied Physics, Part 2: Letters |
Volume | 40 |
Issue number | 8 B |
DOIs | |
Publication status | Published - 2001 Aug 15 |
Externally published | Yes |
Keywords
- Laser evaporation
- Molecular beam
- Nitric oxide
- Nitridation
- Nitrous oxide
- Oxidation
- Oxygen atom
- Ozone
- Photodissociation
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)