Image formation by continuous writing with multi-beam in X-ray nanolithography

E. Toyota, Masakazu Washio

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    Summary form only given. Difficulties in X-ray lithography are now condensed into mask related matters. Since the exposure mode is basically 1:1, more strict accuracy is requested for mask fabrication than for the final images. Mask fabrication technology has made remarkable progress, and image formation of 70 nm line width was reported recently (Miyatake et al, 2001). Meanwhile, pattern reduction necessitates narrowing gaps between mask and wafer, since the gaps decrease in proportion to the square of the line width. If we want to form 25-35 nm two-dimensional patterns in future, mask-wafer gaps of 2-4 μm are needed; it is impractical. Therefore, around 50-70 nm image forming has been considered as the limits of X-ray lithography. Recently, three types of X-ray mask were proposed which enable 25-35 nm image formation while keeping a practical proximity gap >8 μm. The first is enlarged pattern masks (EPMs), applying a line-narrowing effect by edge diffraction. The second is interference slit masks (ISMs), which form design images by interference effect from the slits of the mask. The third is focusing x-ray masks (FXMs), which form an array of concave lenses using the absorbing materials on the mask membrane. These masks, which reduce mask patterns partially (PRMs: partially reducing masks), relieve the limitation of the proximity gaps. In this article, we discuss the design of the masks, beamlines and procedures of writing for 25 nm image formations.

    Original languageEnglish
    Title of host publication2001 International Microprocesses and Nanotechnology Conference, MNC 2001
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages140-141
    Number of pages2
    ISBN (Print)4891140178, 9784891140175
    DOIs
    Publication statusPublished - 2001
    EventInternational Microprocesses and Nanotechnology Conference, MNC 2001 - Shimane, Japan
    Duration: 2001 Oct 312001 Nov 2

    Other

    OtherInternational Microprocesses and Nanotechnology Conference, MNC 2001
    CountryJapan
    CityShimane
    Period01/10/3101/11/2

    Fingerprint

    Nanolithography
    Masks
    Image processing
    masks
    X-Rays
    X rays
    x rays
    X ray lithography
    Linewidth
    slits
    proximity
    lithography
    wafers
    interference
    Fabrication
    fabrication

    ASJC Scopus subject areas

    • Biotechnology
    • Fluid Flow and Transfer Processes
    • Electrical and Electronic Engineering
    • Electronic, Optical and Magnetic Materials
    • Instrumentation

    Cite this

    Toyota, E., & Washio, M. (2001). Image formation by continuous writing with multi-beam in X-ray nanolithography. In 2001 International Microprocesses and Nanotechnology Conference, MNC 2001 (pp. 140-141). [984129] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.2001.984129

    Image formation by continuous writing with multi-beam in X-ray nanolithography. / Toyota, E.; Washio, Masakazu.

    2001 International Microprocesses and Nanotechnology Conference, MNC 2001. Institute of Electrical and Electronics Engineers Inc., 2001. p. 140-141 984129.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Toyota, E & Washio, M 2001, Image formation by continuous writing with multi-beam in X-ray nanolithography. in 2001 International Microprocesses and Nanotechnology Conference, MNC 2001., 984129, Institute of Electrical and Electronics Engineers Inc., pp. 140-141, International Microprocesses and Nanotechnology Conference, MNC 2001, Shimane, Japan, 01/10/31. https://doi.org/10.1109/IMNC.2001.984129
    Toyota E, Washio M. Image formation by continuous writing with multi-beam in X-ray nanolithography. In 2001 International Microprocesses and Nanotechnology Conference, MNC 2001. Institute of Electrical and Electronics Engineers Inc. 2001. p. 140-141. 984129 https://doi.org/10.1109/IMNC.2001.984129
    Toyota, E. ; Washio, Masakazu. / Image formation by continuous writing with multi-beam in X-ray nanolithography. 2001 International Microprocesses and Nanotechnology Conference, MNC 2001. Institute of Electrical and Electronics Engineers Inc., 2001. pp. 140-141
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