Improved inclined multi-lithography using water as exposure medium and its 3D mixing microchannel application

Hironobu Sato, Daisuke Yagyu, Seiki Ito, Shuichi Shoji

Research output: Contribution to journalArticle

44 Citations (Scopus)

Abstract

This paper presents the inclined UV lithography in water medium and 3D mixing microchannel application. The theoretical limit of the inclination angle of the structure is determined by the difference of the refractive index between air and SU-8. In order to reduce the mismatch of the refractive index between air and photoresist, DI water was used as exposure medium instead of air. As a result, the maximum angle of the inclined structure was improved from 38.7°(in air) to 56.2°(in water). Fine and high aspect ratio SU-8 structures were obtained using UV exposure in water medium. As a microfluidic application, a microchannel having 3D slanted grooves was designed and fabricated. 45°slanted grooves were formed successfully on the sidewalls of the microchannel by using inclined UV exposure in water medium. Mixing efficiency of this microchannel was evaluated by CFD simulation and cross-sectional fluorescence image detection using confocal microscope.

Original languageEnglish
Pages (from-to)183-190
Number of pages8
JournalSensors and Actuators, A: Physical
Volume128
Issue number1
DOIs
Publication statusPublished - 2006 Mar 31

Keywords

  • 3D microstructures
  • CFD simulation
  • Inclined multi-lithography
  • Micromixing
  • UV exposure in water medium

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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