Improvement in thermal reliability of a flip chip interconnection system joined by Pb-free solder and Au bumps

S. Terashima, T. Uno, E. Hashino, Kohei Tatsumi

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

The failure mechanism and improvement in the thermal reliability were studied of a new flip chip interconnection system using Au bumps on Si chips and Sn bumps on substrates. The thermal reliability of this flip chip depended on the diffusion behaviour at the Au/Sn bonded interface. Kirkendall voids, which were formed at the Au/Sn bonded interface, induced cracks and impaired the reliability. By the addition of Ag into the Sn bumps, the reliability was improved, due to the formation of an Ag concentrated layer at the Au/Sn bonded interface which acted as a barrier to Au-Sn further interdiffusion and suppressed the Kirkendall voiding. The AuSn phase grew faster than the other Au-Sn intermetallic compounds did at the Au/Sn bonded interface after annealing. Activation energy for AuSn growth was 29.3 kJ·mol-1.

Original languageEnglish
Pages (from-to)803-808
Number of pages6
JournalMaterials Transactions
Volume42
Issue number5
Publication statusPublished - 2001
Externally publishedYes

Fingerprint

solders
chips
Intermetallics
intermetallics
voids
cracks
Activation energy
Annealing
activation energy
Cracks
annealing
Hot Temperature
Lead-free solders
Substrates

Keywords

  • Activation energy
  • Diffusion
  • Flip chip
  • Gold
  • Kirkendall void
  • Lead free solder
  • Microjoining
  • Silver
  • Thermal reliability
  • Tin

ASJC Scopus subject areas

  • Materials Science(all)
  • Metals and Alloys

Cite this

Improvement in thermal reliability of a flip chip interconnection system joined by Pb-free solder and Au bumps. / Terashima, S.; Uno, T.; Hashino, E.; Tatsumi, Kohei.

In: Materials Transactions, Vol. 42, No. 5, 2001, p. 803-808.

Research output: Contribution to journalArticle

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