Improvement of the durability of crosslinked PTFE molds for UV- /EB-nanoimprint lithography

Tomohiro Takahashi, Akinobu Kobayashi, Satoshi Okubo, Tomoko Gowa Oyama, Takaharu Miura, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

    Research output: Contribution to journalArticle

    Abstract

    It has been reported that the nano- /micro- fabricated crosslinked polytetrafluoroethylene (RX-PTFE) by focused ion beam (FIB) direct etching technique could be used as the polymeric molds for the ultraviolet nanoimprint lithography (UV-NIL) and electron beam NIL (EB-NIL). In this study, to evaluate the durability of RX-PTFE molds for repeating printing cycles, the RX-PTFE was spin-coated on two kinds of substrates; none-metal treated silicon wafer and 50 nm thick Al-layer deposited one. Then, RX-PTFE molds were obtained by FIB irradiation. 450 × 450 nm and 950 × 950 nm squares and Φ 1000 nm circle were fabricated in 40 × 40 μm areas. Intervals of the squares and circle were 450 nm, 950 nm and 1000 nm, respectively. In the case of none-treated substrate, the 3 rd imprinted pattern was distorted. On the other hand, the 10 th imprinted patterns with UV-NIL were successfully obtained with the Al-layer deposited substrate. Though it is concerned about the mechanical strength of RX-PTFE degrading due to EB irradiation, EB-NIL was similarly succeeded with Al-layer deposited substrate. It is considered that the mold durability for printing would be improved due to high adhesion between Al-layer and RX-PTFE, because the fluorination of Al was caused by crosslinking treatment at high temperatures. Thus, it is suggested that the durability of RX-PTFE mold with Al-layer deposited substrate would be retained after 10 times UV- /EB-NIL processes.

    Original languageEnglish
    Pages (from-to)249-253
    Number of pages5
    JournalJournal of Photopolymer Science and Technology
    Volume25
    Issue number2
    DOIs
    Publication statusPublished - 2012

    Fingerprint

    Nanoimprint lithography
    Polytetrafluoroethylene
    Molds
    Polytetrafluoroethylenes
    Durability
    Substrates
    Electron beams
    Focused ion beams
    Printing
    Irradiation
    Fluorination
    Silicon wafers
    Crosslinking
    Strength of materials
    Etching
    Adhesion
    Metals

    Keywords

    • Crosslinked PTFE
    • Durability
    • EB-NIL
    • Polymer mold
    • UV-NIL

    ASJC Scopus subject areas

    • Materials Chemistry
    • Polymers and Plastics
    • Organic Chemistry

    Cite this

    Improvement of the durability of crosslinked PTFE molds for UV- /EB-nanoimprint lithography. / Takahashi, Tomohiro; Kobayashi, Akinobu; Okubo, Satoshi; Oyama, Tomoko Gowa; Miura, Takaharu; Oshima, Akihiro; Tagawa, Seiichi; Washio, Masakazu.

    In: Journal of Photopolymer Science and Technology, Vol. 25, No. 2, 2012, p. 249-253.

    Research output: Contribution to journalArticle

    Takahashi, Tomohiro ; Kobayashi, Akinobu ; Okubo, Satoshi ; Oyama, Tomoko Gowa ; Miura, Takaharu ; Oshima, Akihiro ; Tagawa, Seiichi ; Washio, Masakazu. / Improvement of the durability of crosslinked PTFE molds for UV- /EB-nanoimprint lithography. In: Journal of Photopolymer Science and Technology. 2012 ; Vol. 25, No. 2. pp. 249-253.
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