Abstract
It has been reported that the nano- /micro- fabricated crosslinked polytetrafluoroethylene (RX-PTFE) by focused ion beam (FIB) direct etching technique could be used as the polymeric molds for the ultraviolet nanoimprint lithography (UV-NIL) and electron beam NIL (EB-NIL). In this study, to evaluate the durability of RX-PTFE molds for repeating printing cycles, the RX-PTFE was spin-coated on two kinds of substrates; none-metal treated silicon wafer and 50 nm thick Al-layer deposited one. Then, RX-PTFE molds were obtained by FIB irradiation. 450 × 450 nm and 950 × 950 nm squares and Φ 1000 nm circle were fabricated in 40 × 40 μm areas. Intervals of the squares and circle were 450 nm, 950 nm and 1000 nm, respectively. In the case of none-treated substrate, the 3 rd imprinted pattern was distorted. On the other hand, the 10 th imprinted patterns with UV-NIL were successfully obtained with the Al-layer deposited substrate. Though it is concerned about the mechanical strength of RX-PTFE degrading due to EB irradiation, EB-NIL was similarly succeeded with Al-layer deposited substrate. It is considered that the mold durability for printing would be improved due to high adhesion between Al-layer and RX-PTFE, because the fluorination of Al was caused by crosslinking treatment at high temperatures. Thus, it is suggested that the durability of RX-PTFE mold with Al-layer deposited substrate would be retained after 10 times UV- /EB-NIL processes.
| Original language | English |
|---|---|
| Pages (from-to) | 249-253 |
| Number of pages | 5 |
| Journal | Journal of Photopolymer Science and Technology |
| Volume | 25 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 2012 |
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Keywords
- Crosslinked PTFE
- Durability
- EB-NIL
- Polymer mold
- UV-NIL
ASJC Scopus subject areas
- Materials Chemistry
- Polymers and Plastics
- Organic Chemistry
Cite this
Improvement of the durability of crosslinked PTFE molds for UV- /EB-nanoimprint lithography. / Takahashi, Tomohiro; Kobayashi, Akinobu; Okubo, Satoshi; Oyama, Tomoko Gowa; Miura, Takaharu; Oshima, Akihiro; Tagawa, Seiichi; Washio, Masakazu.
In: Journal of Photopolymer Science and Technology, Vol. 25, No. 2, 2012, p. 249-253.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Improvement of the durability of crosslinked PTFE molds for UV- /EB-nanoimprint lithography
AU - Takahashi, Tomohiro
AU - Kobayashi, Akinobu
AU - Okubo, Satoshi
AU - Oyama, Tomoko Gowa
AU - Miura, Takaharu
AU - Oshima, Akihiro
AU - Tagawa, Seiichi
AU - Washio, Masakazu
PY - 2012
Y1 - 2012
N2 - It has been reported that the nano- /micro- fabricated crosslinked polytetrafluoroethylene (RX-PTFE) by focused ion beam (FIB) direct etching technique could be used as the polymeric molds for the ultraviolet nanoimprint lithography (UV-NIL) and electron beam NIL (EB-NIL). In this study, to evaluate the durability of RX-PTFE molds for repeating printing cycles, the RX-PTFE was spin-coated on two kinds of substrates; none-metal treated silicon wafer and 50 nm thick Al-layer deposited one. Then, RX-PTFE molds were obtained by FIB irradiation. 450 × 450 nm and 950 × 950 nm squares and Φ 1000 nm circle were fabricated in 40 × 40 μm areas. Intervals of the squares and circle were 450 nm, 950 nm and 1000 nm, respectively. In the case of none-treated substrate, the 3 rd imprinted pattern was distorted. On the other hand, the 10 th imprinted patterns with UV-NIL were successfully obtained with the Al-layer deposited substrate. Though it is concerned about the mechanical strength of RX-PTFE degrading due to EB irradiation, EB-NIL was similarly succeeded with Al-layer deposited substrate. It is considered that the mold durability for printing would be improved due to high adhesion between Al-layer and RX-PTFE, because the fluorination of Al was caused by crosslinking treatment at high temperatures. Thus, it is suggested that the durability of RX-PTFE mold with Al-layer deposited substrate would be retained after 10 times UV- /EB-NIL processes.
AB - It has been reported that the nano- /micro- fabricated crosslinked polytetrafluoroethylene (RX-PTFE) by focused ion beam (FIB) direct etching technique could be used as the polymeric molds for the ultraviolet nanoimprint lithography (UV-NIL) and electron beam NIL (EB-NIL). In this study, to evaluate the durability of RX-PTFE molds for repeating printing cycles, the RX-PTFE was spin-coated on two kinds of substrates; none-metal treated silicon wafer and 50 nm thick Al-layer deposited one. Then, RX-PTFE molds were obtained by FIB irradiation. 450 × 450 nm and 950 × 950 nm squares and Φ 1000 nm circle were fabricated in 40 × 40 μm areas. Intervals of the squares and circle were 450 nm, 950 nm and 1000 nm, respectively. In the case of none-treated substrate, the 3 rd imprinted pattern was distorted. On the other hand, the 10 th imprinted patterns with UV-NIL were successfully obtained with the Al-layer deposited substrate. Though it is concerned about the mechanical strength of RX-PTFE degrading due to EB irradiation, EB-NIL was similarly succeeded with Al-layer deposited substrate. It is considered that the mold durability for printing would be improved due to high adhesion between Al-layer and RX-PTFE, because the fluorination of Al was caused by crosslinking treatment at high temperatures. Thus, it is suggested that the durability of RX-PTFE mold with Al-layer deposited substrate would be retained after 10 times UV- /EB-NIL processes.
KW - Crosslinked PTFE
KW - Durability
KW - EB-NIL
KW - Polymer mold
KW - UV-NIL
UR - http://www.scopus.com/inward/record.url?scp=84865005114&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84865005114&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.25.249
DO - 10.2494/photopolymer.25.249
M3 - Article
AN - SCOPUS:84865005114
VL - 25
SP - 249
EP - 253
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 2
ER -