Abstract
This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
| Original language | English |
|---|---|
| Pages (from-to) | 87-92 |
| Number of pages | 6 |
| Journal | Sensors and Actuators, A: Physical |
| Volume | 111 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 2004 Mar 1 |
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Keywords
- 3-D micromesh structure
- Backside exposure
- In-channel microfilter
- SU-8
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Mechanical Engineering
- Instrumentation
Cite this
In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application. / Sato, Hironobu; Kakinuma, Takayuki; Go, Jeung Sang; Shoji, Shuichi.
In: Sensors and Actuators, A: Physical, Vol. 111, No. 1, 01.03.2004, p. 87-92.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application
AU - Sato, Hironobu
AU - Kakinuma, Takayuki
AU - Go, Jeung Sang
AU - Shoji, Shuichi
PY - 2004/3/1
Y1 - 2004/3/1
N2 - This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
AB - This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
KW - 3-D micromesh structure
KW - Backside exposure
KW - In-channel microfilter
KW - SU-8
UR - http://www.scopus.com/inward/record.url?scp=0442280359&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0442280359&partnerID=8YFLogxK
U2 - 10.1016/j.sna.2003.10.009
DO - 10.1016/j.sna.2003.10.009
M3 - Article
VL - 111
SP - 87
EP - 92
JO - Sensors and Actuators, A: Physical
JF - Sensors and Actuators, A: Physical
SN - 0924-4247
IS - 1
ER -