In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Hironobu Sato; Takayuki Kakinuma; Jeung Sang Go; Shuichi Shoji

doi:10.1016/j.sna.2003.10.009

In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Hironobu Sato^*, Takayuki Kakinuma, Jeung Sang Go, Shuichi Shoji

^*Corresponding author for this work

School of Fundamental Science and Engineering

Research output: Contribution to journal › Conference article › peer-review

58 Citations (Scopus)

Abstract

This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

Original language	English
Pages (from-to)	87-92
Number of pages	6
Journal	Sensors and Actuators, A: Physical
Volume	111
Issue number	1
DOIs	https://doi.org/10.1016/j.sna.2003.10.009
Publication status	Published - 2004 Mar 1
Event	Micromechanics Section of Sensors and Actuators, based on - Kyoto, Japan Duration: 2003 Jan 19 → 2003 Jan 23

Keywords

3-D micromesh structure
Backside exposure
In-channel microfilter
SU-8

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films
Metals and Alloys
Electrical and Electronic Engineering

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10.1016/j.sna.2003.10.009

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title = "In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application",

abstract = "This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.",

keywords = "3-D micromesh structure, Backside exposure, In-channel microfilter, SU-8",

author = "Hironobu Sato and Takayuki Kakinuma and Go, {Jeung Sang} and Shuichi Shoji",

note = "Funding Information: This work was supported by the Japanese Ministry of Education, Culture Sport, Science and Technology Grant-in-Aids for COE Research of Waseda University, Scientific Research Priority Area (B) No.13124209, Scientific Research (B) No.12450167, Japan Society for the Promotion Science Grant-in-Aids for Creative Scientific Research No.13BS0024, “Nanotechnology Support Project” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan and 21COE “Practical Nano-Chemistry” from MEXT, Japan. ; Micromechanics Section of Sensors and Actuators, based on ; Conference date: 19-01-2003 Through 23-01-2003",

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doi = "10.1016/j.sna.2003.10.009",

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AU - Sato, Hironobu

AU - Kakinuma, Takayuki

AU - Go, Jeung Sang

AU - Shoji, Shuichi

N1 - Funding Information: This work was supported by the Japanese Ministry of Education, Culture Sport, Science and Technology Grant-in-Aids for COE Research of Waseda University, Scientific Research Priority Area (B) No.13124209, Scientific Research (B) No.12450167, Japan Society for the Promotion Science Grant-in-Aids for Creative Scientific Research No.13BS0024, “Nanotechnology Support Project” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan and 21COE “Practical Nano-Chemistry” from MEXT, Japan.

PY - 2004/3/1

Y1 - 2004/3/1

N2 - This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

AB - This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

KW - 3-D micromesh structure

KW - Backside exposure

KW - In-channel microfilter

KW - SU-8

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JO - Sensors and Actuators, A: Physical

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ER -

In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Abstract

Keywords

ASJC Scopus subject areas

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