In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Hironobu Sato; Takayuki Kakinuma; Jeung Sang Go; Shuichi Shoji

doi:10.1016/j.sna.2003.10.009

In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Hironobu Sato, Takayuki Kakinuma, Jeung Sang Go, Shuichi Shoji

School of Fundamental Science and Engineering

Research output: Contribution to journal › Conference article

57 Citations (Scopus)

Abstract

This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

Original language	English
Pages (from-to)	87-92
Number of pages	6
Journal	Sensors and Actuators, A: Physical
Volume	111
Issue number	1
DOIs	https://doi.org/10.1016/j.sna.2003.10.009
Publication status	Published - 2004 Mar 1
Event	Micromechanics Section of Sensors and Actuators, based on - Kyoto, Japan Duration: 2003 Jan 19 → 2003 Jan 23

Keywords

3-D micromesh structure
Backside exposure
In-channel microfilter
SU-8

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films
Metals and Alloys
Electrical and Electronic Engineering

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Cite this

Sato, H., Kakinuma, T., Go, J. S., & Shoji, S. (2004). In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application. Sensors and Actuators, A: Physical, 111(1), 87-92. https://doi.org/10.1016/j.sna.2003.10.009

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abstract = "This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.",

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