Abstract
This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.
Original language | English |
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Pages (from-to) | 87-92 |
Number of pages | 6 |
Journal | Sensors and Actuators, A: Physical |
Volume | 111 |
Issue number | 1 |
DOIs | |
Publication status | Published - 2004 Mar 1 |
Event | Micromechanics Section of Sensors and Actuators, based on - Kyoto, Japan Duration: 2003 Jan 19 → 2003 Jan 23 |
Keywords
- 3-D micromesh structure
- Backside exposure
- In-channel microfilter
- SU-8
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Metals and Alloys
- Electrical and Electronic Engineering