In-situ measurement of the optical constant of ultrathin films using optical fiber sensor

Naganori Takezawa, Isamu Kato

Research output: Contribution to journalArticle

Abstract

We use an optical fiber sensor whose part of clad is removed for the optical constants of ultra thin film measurement. The sensitivity of the sensor is increased by decreasing the diameter of the optical fiber and/or increasing the length of the film deposited part. The result of the in situ measurement method of change of amorphous hydrogenated silicon (a-Si:H) ultra thin films by oxidation with passage of time by leaking from vacuum to atmospheric air is shown. We use an optical fiber sensor whose length of the film deposited part is 100 mm, diameter of the core is 110 μm and the core material is silica. a-Si:H film with approximately 10 nm in thickness is deposited on the core of the optical fiber sensor. The oxidation saturates in approximately 600 s. The larger attenuation of transmitted light at the long wavelengths from 685 to 800 nm is observed. This phenomenon is maybe due to the change of defects by relaxation.

Original languageEnglish
Pages (from-to)355-361
Number of pages7
JournalUnknown Journal
Volume2997
DOIs
Publication statusPublished - 1997

Keywords

  • A-Si:H
  • Fiber sensor
  • In situ measurement
  • Oxidation
  • Ultra thin film
  • Waveguide sensor

ASJC Scopus subject areas

  • Applied Mathematics
  • Computer Science Applications
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

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