In situ study on electroless-deposition process by scanning tunneling microscopy

Takayuki Homma, Takuya Yamazaki, Tetsuya Osaka

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.

Original languageEnglish
Pages (from-to)732-736
Number of pages5
JournalJournal of the Electrochemical Society
Volume139
Issue number3
Publication statusPublished - 1992 Mar

Fingerprint

electroless deposition
Electroless plating
Scanning tunneling microscopy
scanning tunneling microscopy
Electrodeposition
electrodeposition
Nucleation
nucleation
Electrodes
electrodes
Substrates

ASJC Scopus subject areas

  • Electrochemistry
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

In situ study on electroless-deposition process by scanning tunneling microscopy. / Homma, Takayuki; Yamazaki, Takuya; Osaka, Tetsuya.

In: Journal of the Electrochemical Society, Vol. 139, No. 3, 03.1992, p. 732-736.

Research output: Contribution to journalArticle

@article{4d70830879ae4a539a85cd66f52f3bdb,
title = "In situ study on electroless-deposition process by scanning tunneling microscopy",
abstract = "The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.",
author = "Takayuki Homma and Takuya Yamazaki and Tetsuya Osaka",
year = "1992",
month = "3",
language = "English",
volume = "139",
pages = "732--736",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",
number = "3",

}

TY - JOUR

T1 - In situ study on electroless-deposition process by scanning tunneling microscopy

AU - Homma, Takayuki

AU - Yamazaki, Takuya

AU - Osaka, Tetsuya

PY - 1992/3

Y1 - 1992/3

N2 - The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.

AB - The electroless-deposition process of NiP film was studied using in situ scanning tunneling microscopy (STM). By potentiostatic control of the substrate electrode during the STM scan, the initial deposition process of NiP was observed, revealing features that differ from those of the electrodeposition process, which was also observed in situ. The growth process over the same area during the progress of deposition was also observed sequentially. The results obtained suggest that the electroless-deposition process of NiP is a result of continuous nucleation of grains and their three-dimensional growth.

UR - http://www.scopus.com/inward/record.url?scp=0026834809&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0026834809&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0026834809

VL - 139

SP - 732

EP - 736

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

IS - 3

ER -