In situ tuning of magnetization and magnetoresistance in fe3o4 thin film achieved with all-solid-state redox device

Takashi Tsuchiya*, Kazuya Terabe, Masanori Ochi, Tohru Higuchi, Minoru Osada, Yoshiyuki Yamashita, Shigenori Ueda, Masakazu Aono

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

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