Increase of the resistivity of electroless-deposited high-Bs CoNiFeB thin films

Masataka Sobue, Takayuki Segawa, Tokihiko Yokoshima, Tetsuya Osaka, Daiju Kaneko, Atsushi Tanaka

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In order to increase the resistivity of electroless-deposited high-Bs CoNiFeB thin films, it was decided to investigate the effect of adding a β-alanine containing complexing agent to the plating bath. The resistivity (ρ) gradually increased as the β-alanine concentration was increased. CoNiFeB thin films with desirable soft magnetic properties, Bs = 17-17.5 kG and Hc < 3.0 Oe, were obtained under these conditions with ρ value (70-90 μΩ cm) dependant on carbon incorporation in the films. It has been suggested that carbon impurities in the films resulting from the use of the β-alanine complexing agent containing -NH2 group causes electron scattering, leading to an increase in the resistivity.

Original languageEnglish
Pages (from-to)2228-2230
Number of pages3
JournalIEEE Transactions on Magnetics
Volume38
Issue number5 I
DOIs
Publication statusPublished - 2002 Sep

Fingerprint

alanine
Alanine
Thin films
electrical resistivity
Carbon
Electron scattering
thin films
Plating
Magnetic properties
carbon
Impurities
plating
baths
electron scattering
magnetic properties
impurities
causes

Keywords

  • Additives
  • CoNiFe
  • Electroless deposition
  • High B
  • Organic
  • Resistivity
  • Soft magnetic thin films

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)

Cite this

Increase of the resistivity of electroless-deposited high-Bs CoNiFeB thin films. / Sobue, Masataka; Segawa, Takayuki; Yokoshima, Tokihiko; Osaka, Tetsuya; Kaneko, Daiju; Tanaka, Atsushi.

In: IEEE Transactions on Magnetics, Vol. 38, No. 5 I, 09.2002, p. 2228-2230.

Research output: Contribution to journalArticle

Sobue, Masataka ; Segawa, Takayuki ; Yokoshima, Tokihiko ; Osaka, Tetsuya ; Kaneko, Daiju ; Tanaka, Atsushi. / Increase of the resistivity of electroless-deposited high-Bs CoNiFeB thin films. In: IEEE Transactions on Magnetics. 2002 ; Vol. 38, No. 5 I. pp. 2228-2230.
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