Increase on the resistivity of electrolessly deposited high Bs CoNiFeB thin films

Tokihiko Yokoshima, M. Sobue, T. Segawa, Tetsuya Osaka, D. Kaneko, A. Tanaka

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

An electrodeposited CoNiFe soft magnetic thin film with Bs as high as 20-21 kG is very attractive as a candidate for write head core materials, meeting the demand for increasing magnetic recording density. We developed electrolessly deposited CoNiFe-based soft magnetic thin films with 18-19 kG of Bs and 30 μΩcm of resistivity. This thin film formation method has the advantage of fabricating smaller and finer head cores, which can realize higher recording density compared with conventional techniques of fabricating head cores. For higher-frequency recording, the electroless CoNiFeB film should have higher resistivity whilst keeping high Bs for suppressing eddy-current losses. Therefore, we investigated increasing the resistivity of high Bs CoNiFeB soft magnetic thin films prepared by electroless deposition.

Original languageEnglish
Title of host publicationINTERMAG Europe 2002 - IEEE International Magnetics Conference
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)0780373650, 9780780373655
DOIs
Publication statusPublished - 2002
Event2002 IEEE International Magnetics Conference, INTERMAG Europe 2002 - Amsterdam, Netherlands
Duration: 2002 Apr 282002 May 2

Other

Other2002 IEEE International Magnetics Conference, INTERMAG Europe 2002
CountryNetherlands
CityAmsterdam
Period02/4/2802/5/2

Fingerprint

Magnetic thin films
Thin films
Magnetic recording
Electroless plating
Eddy currents

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering
  • Surfaces, Coatings and Films

Cite this

Yokoshima, T., Sobue, M., Segawa, T., Osaka, T., Kaneko, D., & Tanaka, A. (2002). Increase on the resistivity of electrolessly deposited high Bs CoNiFeB thin films. In INTERMAG Europe 2002 - IEEE International Magnetics Conference [1000675] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/INTMAG.2002.1000675

Increase on the resistivity of electrolessly deposited high Bs CoNiFeB thin films. / Yokoshima, Tokihiko; Sobue, M.; Segawa, T.; Osaka, Tetsuya; Kaneko, D.; Tanaka, A.

INTERMAG Europe 2002 - IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc., 2002. 1000675.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Yokoshima, T, Sobue, M, Segawa, T, Osaka, T, Kaneko, D & Tanaka, A 2002, Increase on the resistivity of electrolessly deposited high Bs CoNiFeB thin films. in INTERMAG Europe 2002 - IEEE International Magnetics Conference., 1000675, Institute of Electrical and Electronics Engineers Inc., 2002 IEEE International Magnetics Conference, INTERMAG Europe 2002, Amsterdam, Netherlands, 02/4/28. https://doi.org/10.1109/INTMAG.2002.1000675
Yokoshima T, Sobue M, Segawa T, Osaka T, Kaneko D, Tanaka A. Increase on the resistivity of electrolessly deposited high Bs CoNiFeB thin films. In INTERMAG Europe 2002 - IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc. 2002. 1000675 https://doi.org/10.1109/INTMAG.2002.1000675
Yokoshima, Tokihiko ; Sobue, M. ; Segawa, T. ; Osaka, Tetsuya ; Kaneko, D. ; Tanaka, A. / Increase on the resistivity of electrolessly deposited high Bs CoNiFeB thin films. INTERMAG Europe 2002 - IEEE International Magnetics Conference. Institute of Electrical and Electronics Engineers Inc., 2002.
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