Increasing the resistivity of electrodeposited high BS CoNiFe thin film

Tokihiko Yokoshima, Manabu Kaseda, Masahiro Yamada, Takuya Nakanishi, Toshiyuki Momma, Tetsuya Osaka

    Research output: Contribution to journalArticle

    25 Citations (Scopus)

    Abstract

    In order to increase the resistivity of electrodeposited high BS CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC, were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ = 25-90 μΩ-cm under the conditions of BS > 1.9 T and HC < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ = 130 μΩ-cm was established under the conditions of BS= 1.7 T and HC < 6 Oe.

    Original languageEnglish
    Pages (from-to)2499-2501
    Number of pages3
    JournalIEEE Transactions on Magnetics
    Volume35
    Issue number5 PART 1
    DOIs
    Publication statusPublished - 1999

    Fingerprint

    Magnetic thin films
    Thin films
    electrical resistivity
    thin films
    Plating
    Carbon
    plating
    baths
    carbon
    diethylenetriamine

    Keywords

    • Electrodeposition
    • High b high resistivity
    • Soft magnetic thin film

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Physics and Astronomy (miscellaneous)

    Cite this

    Increasing the resistivity of electrodeposited high BS CoNiFe thin film. / Yokoshima, Tokihiko; Kaseda, Manabu; Yamada, Masahiro; Nakanishi, Takuya; Momma, Toshiyuki; Osaka, Tetsuya.

    In: IEEE Transactions on Magnetics, Vol. 35, No. 5 PART 1, 1999, p. 2499-2501.

    Research output: Contribution to journalArticle

    Yokoshima, Tokihiko ; Kaseda, Manabu ; Yamada, Masahiro ; Nakanishi, Takuya ; Momma, Toshiyuki ; Osaka, Tetsuya. / Increasing the resistivity of electrodeposited high BS CoNiFe thin film. In: IEEE Transactions on Magnetics. 1999 ; Vol. 35, No. 5 PART 1. pp. 2499-2501.
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    AU - Yamada, Masahiro

    AU - Nakanishi, Takuya

    AU - Momma, Toshiyuki

    AU - Osaka, Tetsuya

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