Increasing the resistivity of electrodeposited high BS CoNiFe thin film

Tokihiko Yokoshima, Manabu Kaseda, Masahiro Yamada, Takuya Nakanishi, Toshiyuki Momma, Tetsuya Osaka

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

In order to increase the resistivity of electrodeposited high BS CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of ρ and HC, were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with ρ = 25-90 μΩ-cm under the conditions of BS > 1.9 T and HC < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with ρ = 130 μΩ-cm was established under the conditions of BS= 1.7 T and HC < 6 Oe.

Original languageEnglish
Pages (from-to)2499-2501
Number of pages3
JournalIEEE Transactions on Magnetics
Volume35
Issue number5 PART 1
DOIs
Publication statusPublished - 1999 Dec 1

Keywords

  • Electrodeposition
  • High b high resistivity
  • Soft magnetic thin film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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