Influence of deposition temperature on the microstructure of Pb-Ti-Nb-O thin films by metallorganic chemical vapor deposition

Xue Dong Liu, Hiroshi Funakubo, Suguru Noda, Hiroshi Komiyama

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

In the current study, we grew Pb-Ti-Nb-O (PTN) thin films on Pt/Ti/SiO2/Si substrate by metallorganic chemical vapor deposition (MOCVD) at temperatures ranging from 400 to 620°C. The thin films obtained were examined by X-ray diffraction and cross-sectional transmission electron microscopy. It was revealed that both the PTN film and its interface with the underlying Pt layer were quite sensitive to variations in the deposition temperature. The considerable change in surface morphology of PTN thin films with an enhanced deposition temperature is discussed in relation to the surface hillocks formed on the Pt layer by aggregation of the out-diffused Pt atoms during MOCVD.

Original languageEnglish
Pages (from-to)C227-C230
JournalJournal of the Electrochemical Society
Volume148
Issue number3
DOIs
Publication statusPublished - 2001 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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