Abstract
The influence of the crystalline and surface properties of diamond homoepitaxial layers on device properties in H-terminated surface-channel diamond field effect transistors (FETs) is investigated. Crystalline defects inside the layers result in gate current leakage in FET DC operation. We confirmed incorporation of boron acceptors inside the layers. Their residual acceptors result in buffer leakage in DC operation, but do not affect RF characteristics much. Adsorbates from the environment change the concentration of the surface holes generated by the H-termination.
Original language | English |
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Pages (from-to) | 226-232 |
Number of pages | 7 |
Journal | Diamond and Related Materials |
Volume | 13 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2004 Feb |
Externally published | Yes |
Keywords
- High frequency electronics
- Homoepitaxy
- Surface electronic properties
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Chemistry(all)
- Mechanical Engineering
- Materials Chemistry
- Electrical and Electronic Engineering