Influence of toluene vapor on the H 2-selective performance of dimethoxydiphenylsilane-derived silica membranes prepared by the chemical vapor deposition method

Masahiro Seshimo, Takashi Saito, Kazuki Akamatsu, Atsushi Segawa, Shin ichi Nakao

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

We have investigated the influence of coexisting toluene vapor on H 2, N 2 and SF 6 permeation properties through dimethoxydiphenylsilane-derived silica membranes in the temperature range 573-298K and toluene concentrations of 0.5%-2.0%. Among these three gases, N 2 permeance was most susceptible to the influence of coexistence of toluene, resulting in the decrease of the permeance. In addition, we also confirmed that these decreased permeances recovered after keeping the membrane at 573K for 5h. Based on these results, the toluene molecules physically condensed or adsorbed on the membrane surface or the inside of the pores to prevent the permeation of the gases at lower temperature, and these molecules could be effectively removed at higher temperature. In addition, we successfully demonstrated, using a laser ionization compact analyzer that can measure the concentration every 50s that this membrane can stably provide hydrogen with higher than 99.99% purity from a hydrogen gas mixture containing 2.0% toluene vapor.

Original languageEnglish
Pages (from-to)51-56
Number of pages6
JournalJournal of Membrane Science
Volume415-416
DOIs
Publication statusPublished - 2012 Oct 1
Externally publishedYes

Keywords

  • Chemical vapor deposition
  • Dimethoxydiphenylsilane
  • Hydrogen separation
  • Silica membrane
  • Toluene vapor

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Materials Science(all)
  • Biochemistry
  • Filtration and Separation

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