Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

T. Q. Li; S. Noda; Y. Tsuji; T. Ohsawa; H. Komiyama

doi:10.1116/1.1458944

Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

T. Q. Li, S. Noda, Y. Tsuji, T. Ohsawa, H. Komiyama

Research output: Contribution to journal › Article › peer-review

77 Citations (Scopus)

Abstract

The initial growth and texture formation mechanism of TiN films were studied by using TEM and XRD. In the early stages of TiN deposition, randomly oriented nuclei were observed in a continuous TiN layer. TiN exhibited (111)-preferred orientation under relatively low N₂ partial pressure and (200)-preferred orientation under relatively high N₂ partial pressure.

Original language	English
Pages (from-to)	583-588
Number of pages	6
Journal	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume	20
Issue number	3
DOIs	https://doi.org/10.1116/1.1458944
Publication status	Published - 2002
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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abstract = "The initial growth and texture formation mechanism of TiN films were studied by using TEM and XRD. In the early stages of TiN deposition, randomly oriented nuclei were observed in a continuous TiN layer. TiN exhibited (111)-preferred orientation under relatively low N2 partial pressure and (200)-preferred orientation under relatively high N2 partial pressure.",

author = "Li, {T. Q.} and S. Noda and Y. Tsuji and T. Ohsawa and H. Komiyama",

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AU - Tsuji, Y.

AU - Ohsawa, T.

AU - Komiyama, H.

PY - 2002

Y1 - 2002

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AB - The initial growth and texture formation mechanism of TiN films were studied by using TEM and XRD. In the early stages of TiN deposition, randomly oriented nuclei were observed in a continuous TiN layer. TiN exhibited (111)-preferred orientation under relatively low N2 partial pressure and (200)-preferred orientation under relatively high N2 partial pressure.

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Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

Abstract

ASJC Scopus subject areas

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