Initial growth and texture formation during reactive magnetron sputtering of TiN on Si(111)

T. Q. Li, S. Noda, Y. Tsuji, T. Ohsawa, H. Komiyama

Research output: Contribution to journalArticle

71 Citations (Scopus)

Abstract

The initial growth and texture formation mechanism of TiN films were studied by using TEM and XRD. In the early stages of TiN deposition, randomly oriented nuclei were observed in a continuous TiN layer. TiN exhibited (111)-preferred orientation under relatively low N2 partial pressure and (200)-preferred orientation under relatively high N2 partial pressure.

Original languageEnglish
Pages (from-to)583-588
Number of pages6
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume20
Issue number3
DOIs
Publication statusPublished - 2002 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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