Abstract
We report, for the first time, the successful fabrication of InP/InGaAs double heterojunction bipolar transistors grown on Si substrates by metalorganic chemical vapor deposition. When the InP buffer layer on Si is thick enough, the transistors exhibit high current gains over 250 and their ideality factor is 1.3; these values are comparable to those in transistors grown on InP substrates.
| Original language | English |
|---|---|
| Title of host publication | Conference on Solid State Devices and Materials |
| Place of Publication | Tokyo, Japan |
| Publisher | Publ by Business Cent for Acad Soc Japan |
| Pages | 74-76 |
| Number of pages | 3 |
| Publication status | Published - 1991 |
| Externally published | Yes |
| Event | 23rd International Conference on Solid State Devices and Materials - SSDM '91 - Yokohama, Jpn Duration: 1991 Aug 27 → 1991 Aug 29 |
Other
| Other | 23rd International Conference on Solid State Devices and Materials - SSDM '91 |
|---|---|
| City | Yokohama, Jpn |
| Period | 91/8/27 → 91/8/29 |
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ASJC Scopus subject areas
- Engineering(all)
Cite this
InP/InGaAs double heterojunction bipolar transistors grown on Si substrates. / Makimoto, Toshiki; Kurishima, Kenji; Kobayashi, Takashi; Ishibashi, Tadao.
Conference on Solid State Devices and Materials. Tokyo, Japan : Publ by Business Cent for Acad Soc Japan, 1991. p. 74-76.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - InP/InGaAs double heterojunction bipolar transistors grown on Si substrates
AU - Makimoto, Toshiki
AU - Kurishima, Kenji
AU - Kobayashi, Takashi
AU - Ishibashi, Tadao
PY - 1991
Y1 - 1991
N2 - We report, for the first time, the successful fabrication of InP/InGaAs double heterojunction bipolar transistors grown on Si substrates by metalorganic chemical vapor deposition. When the InP buffer layer on Si is thick enough, the transistors exhibit high current gains over 250 and their ideality factor is 1.3; these values are comparable to those in transistors grown on InP substrates.
AB - We report, for the first time, the successful fabrication of InP/InGaAs double heterojunction bipolar transistors grown on Si substrates by metalorganic chemical vapor deposition. When the InP buffer layer on Si is thick enough, the transistors exhibit high current gains over 250 and their ideality factor is 1.3; these values are comparable to those in transistors grown on InP substrates.
UR - http://www.scopus.com/inward/record.url?scp=0025842226&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0025842226&partnerID=8YFLogxK
M3 - Conference contribution
SP - 74
EP - 76
BT - Conference on Solid State Devices and Materials
PB - Publ by Business Cent for Acad Soc Japan
CY - Tokyo, Japan
ER -