Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Xue Dong Liu, Hiroshi Funakubo, Suguru Noda, Hiroshi Komiyama

Research output: Contribution to journalArticle

7 Citations (Scopus)


Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

Original languageEnglish
Pages (from-to)253-259
Number of pages7
JournalChemical Vapor Deposition
Issue number6
Publication statusPublished - 2001 Nov 1



  • Formation mechanisms
  • Lead
  • Modelling
  • Niobium
  • Titanium
  • Two-dimensional vector analysis

ASJC Scopus subject areas

  • Chemistry(all)
  • Surfaces and Interfaces
  • Process Chemistry and Technology

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