Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Xue Dong Liu, Hiroshi Funakubo, Suguru Noda, Hiroshi Komiyama

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

Original languageEnglish
Pages (from-to)253-259
Number of pages7
JournalChemical Vapor Deposition
Volume7
Issue number6
DOIs
Publication statusPublished - 2001 Nov
Externally publishedYes

Fingerprint

Surface defects
Metallorganic chemical vapor deposition
surface defects
metalorganic chemical vapor deposition
Thin films
microstructure
Microstructure
thin films
vector analysis
Ferroelectric thin films
Domes
Substrates
domes
Crystallization
Chemical vapor deposition
Metals
vapor deposition
crystallization
Transmission electron microscopy
transmission electron microscopy

Keywords

  • Formation mechanisms
  • Lead
  • MOCVD
  • Modelling
  • Niobium
  • Titanium
  • Two-dimensional vector analysis

ASJC Scopus subject areas

  • Process Chemistry and Technology
  • Electrochemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD. / Liu, Xue Dong; Funakubo, Hiroshi; Noda, Suguru; Komiyama, Hiroshi.

In: Chemical Vapor Deposition, Vol. 7, No. 6, 11.2001, p. 253-259.

Research output: Contribution to journalArticle

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