Investigation of the metal-insulator transition in NdNiO3 films by site-selective X-ray absorption spectroscopy

Natalia Palina, Le Wang, Sibashisa Dash, Xiaojiang Yu, Mark B.H. Breese, Junling Wang, Andrivo Rusydi

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

In this work, multifunctional oxide NdNiO3 (NNO) thin films grown on a SrTiO3 (STO) substrate using pulsed-laser deposition are studied. Temperature dependent resistivity measurements revealed that NNO/STO samples exhibit a sharp thickness dependent metal-insulator transition (MIT) over a range of 150-200 K. It is known that the electronic properties of correlated oxides are extremely complex and sensitive to changes in orbital occupancy. To evaluate the changes in the electronic and/or crystallographic structure responsible for the MIT, a site-selective (O, Ni and Nd) X-ray absorption near edge structure (XANES) analysis is performed above and below the transition temperature. Analysis of XANES spectra suggests that: (i) in NNO films nominally trivalent Ni ions exhibit multiple valency (bond disproportionation), (ii) intermetallic hybridization plays an important role, (iii) the presence of strong O 2p-O 2p hole correlation at low temperature results in the opening of the p-p gap and (iv) the valency of Nd ions matches well with that of Nd3+. For NNO films exhibiting a sharp MIT, Ni 3d electron localization and concurrent existence of Ni 3d8 and Ni 3d8L2 states are responsible for the observed transition. At temperatures below the MIT the O 2p-O 2p hole correlation is strong enough to split the O 2p band stabilizing insulating phase. Temperature and thickness dependent differences observed in the site-selective XANES data are discussed in terms of possible mechanisms for the MIT (negative charge-transfer type).

Original languageEnglish
Pages (from-to)6094-6102
Number of pages9
JournalNanoscale
Volume9
Issue number18
DOIs
Publication statusPublished - 2017 May 14

Fingerprint

X ray absorption spectroscopy
Metal insulator transition
X ray absorption
Ions
Temperature
Pulsed laser deposition
Electronic properties
Oxides
Superconducting transition temperature
Oxide films
Intermetallics
Charge transfer
Thin films
Electrons
Substrates

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Palina, N., Wang, L., Dash, S., Yu, X., Breese, M. B. H., Wang, J., & Rusydi, A. (2017). Investigation of the metal-insulator transition in NdNiO3 films by site-selective X-ray absorption spectroscopy. Nanoscale, 9(18), 6094-6102. https://doi.org/10.1039/c7nr00742f

Investigation of the metal-insulator transition in NdNiO3 films by site-selective X-ray absorption spectroscopy. / Palina, Natalia; Wang, Le; Dash, Sibashisa; Yu, Xiaojiang; Breese, Mark B.H.; Wang, Junling; Rusydi, Andrivo.

In: Nanoscale, Vol. 9, No. 18, 14.05.2017, p. 6094-6102.

Research output: Contribution to journalArticle

Palina, N, Wang, L, Dash, S, Yu, X, Breese, MBH, Wang, J & Rusydi, A 2017, 'Investigation of the metal-insulator transition in NdNiO3 films by site-selective X-ray absorption spectroscopy', Nanoscale, vol. 9, no. 18, pp. 6094-6102. https://doi.org/10.1039/c7nr00742f
Palina, Natalia ; Wang, Le ; Dash, Sibashisa ; Yu, Xiaojiang ; Breese, Mark B.H. ; Wang, Junling ; Rusydi, Andrivo. / Investigation of the metal-insulator transition in NdNiO3 films by site-selective X-ray absorption spectroscopy. In: Nanoscale. 2017 ; Vol. 9, No. 18. pp. 6094-6102.
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