Joule heating induced local electrodeposition for microelectronic circuits

Hiroyuki Kawamoto*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


A fundamental study is performed for local electrodeposition of copper utilizing thermal potential induced by Joule heating. The feasibility of the process for microelectronic applications is assessed by both experiment and mathematical modeling. The results of the investigation show that (i) a copper wire is coated under conditions of a.c. 50 Hz Joule heating in electrolyte containing 1.0 M CuSO4 and 0.5 m H2SO4 with relatively high deposition rate of about 0.4 μm min-1, (ii) the Joule heating current should be kept below the boiling point of the solution to realize uniform deposition, and (iii) results of calculations by the present model based on one-dimensional heat conduction agree well with experimental results.

Original languageEnglish
Pages (from-to)435-442
Number of pages8
JournalJournal of Applied Electrochemistry
Issue number5
Publication statusPublished - 1993 May
Externally publishedYes

ASJC Scopus subject areas

  • Electrochemistry


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