Langmuir-Blodgett fabrication of nanosheet-based dielectric films without an interfacial dead layer

Minoru Osada, Kosho Akatsuka, Yasuo Ebina, Yoshinori Kotani, Kanta Ono, Hiroshi Funakubo, Shigenori Ueda, Keisuke Kobayashi, Kazunori Takada, Takayoshi Sasaki

Research output: Contribution to journalArticle

19 Citations (Scopus)

Abstract

Langmuir-Blodgett (LB) deposition was employed to fabricate high-κ dielectric nanofilms of titania nanosheets. The LB-based layer-by-layer approach using an atomically flat SrRuO3 substrate is effective for the fabrication of atomically uniform and highly dense nanofilms. These films exhibited both high dielectric constant (K ∼ 123) and low leakage current density (J < 10-7 A cm-2) for thicknesses down to 5nm, while eliminating the size-effect problems encountered in current high-κ films. From analyses of interfacial structures by transmission electron microscopy and hard X-ray photoelectron spectroscopy, we have clarified that the films are composed of a well-ordered lamellar structure without an interfacial dead layer. According to first-principles calculations, a highly polarizable nature of titania nanosheets can bring improved dielectric properties, yielding high-κ values even in an ultrathin geometry (< nm).

Original languageEnglish
Pages (from-to)7556-7560
Number of pages5
JournalJapanese Journal of Applied Physics
Volume47
Issue number9 PART 2
DOIs
Publication statusPublished - 2008 Sep 19
Externally publishedYes

Fingerprint

Dielectric films
Nanosheets
Fabrication
fabrication
titanium
Titanium
Lamellar structures
Leakage currents
Dielectric properties
high current
dielectric properties
leakage
Permittivity
Current density
X ray photoelectron spectroscopy
photoelectron spectroscopy
permittivity
current density
Transmission electron microscopy
transmission electron microscopy

Keywords

  • High-κ dielectrics
  • Langmuir-Blodgett deposition
  • Titania nanosheet

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Osada, M., Akatsuka, K., Ebina, Y., Kotani, Y., Ono, K., Funakubo, H., ... Sasaki, T. (2008). Langmuir-Blodgett fabrication of nanosheet-based dielectric films without an interfacial dead layer. Japanese Journal of Applied Physics, 47(9 PART 2), 7556-7560. https://doi.org/10.1143/JJAP.47.7556

Langmuir-Blodgett fabrication of nanosheet-based dielectric films without an interfacial dead layer. / Osada, Minoru; Akatsuka, Kosho; Ebina, Yasuo; Kotani, Yoshinori; Ono, Kanta; Funakubo, Hiroshi; Ueda, Shigenori; Kobayashi, Keisuke; Takada, Kazunori; Sasaki, Takayoshi.

In: Japanese Journal of Applied Physics, Vol. 47, No. 9 PART 2, 19.09.2008, p. 7556-7560.

Research output: Contribution to journalArticle

Osada, M, Akatsuka, K, Ebina, Y, Kotani, Y, Ono, K, Funakubo, H, Ueda, S, Kobayashi, K, Takada, K & Sasaki, T 2008, 'Langmuir-Blodgett fabrication of nanosheet-based dielectric films without an interfacial dead layer', Japanese Journal of Applied Physics, vol. 47, no. 9 PART 2, pp. 7556-7560. https://doi.org/10.1143/JJAP.47.7556
Osada, Minoru ; Akatsuka, Kosho ; Ebina, Yasuo ; Kotani, Yoshinori ; Ono, Kanta ; Funakubo, Hiroshi ; Ueda, Shigenori ; Kobayashi, Keisuke ; Takada, Kazunori ; Sasaki, Takayoshi. / Langmuir-Blodgett fabrication of nanosheet-based dielectric films without an interfacial dead layer. In: Japanese Journal of Applied Physics. 2008 ; Vol. 47, No. 9 PART 2. pp. 7556-7560.
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