LARGE AREA CHEMICAL VAPOUR DEPOSITION OF DIAMOND PARTICLES AND FILMS USING MAGNETO-MICROWAVE PLASMA.

Hiroshi Kawarada, King Sheng Mar, Akio Hiraki

Research output: Chapter in Book/Report/Conference proceedingChapter

105 Citations (Scopus)

Abstract

Large area chemical vapor deposition of diamond has been obtained using magneto-microwave plasma. The important point of the developed system is to set the electron cyclotron resonance condition (875 G), where the highest plasma density is expected, at the deposition area by controlling the distribution of an applied magnetic field. Even in 10 Torr where complete electron gyrations cannot be expected, the size of the discharge area controlled by the magnetic field is 70-80 mm in diameter. This value is the largest of all plasma deposition systems of diamond. The crystallinity obtained by the above-mentioned plasma compares favorably with those of the best ones by previous methods.

Original languageEnglish
Title of host publicationJapanese Journal of Applied Physics, Part 2: Letters
Volume26
Edition6
Publication statusPublished - 1987 Jun
Externally publishedYes

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Kawarada, H., Mar, K. S., & Hiraki, A. (1987). LARGE AREA CHEMICAL VAPOUR DEPOSITION OF DIAMOND PARTICLES AND FILMS USING MAGNETO-MICROWAVE PLASMA. In Japanese Journal of Applied Physics, Part 2: Letters (6 ed., Vol. 26)