LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY UTILIZING THE STEERING OF THE ELECTRON BEAM IN THE STORAGE RING.

Hiroshi Tanino, Koichiro Hoh, Masahiro Hirata, Shingo Ichimura, Nobufumi Atoda, Takio Tomimasu, Tsutomu Noguchi, Suguru Sugiyama, Tetsuo Yamazaki

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

It is demonstrated that the vertical (normal to the plane of electron orbit) width of exposed region in synchrotron radiation lithography can be expanded by a factor of more than three by steering the electron beam in the storage ring with a horizontal magnetic field, without losing intensity and homogeneity. The vertical distribution of the developed thickness in the resist and its vertical shift with the steering magnetic field are evaluated. The perturbation in the electron orbit is also estimated from the shifts of soft X-rays and visible illuminated regions.

Original languageEnglish
Pages (from-to)l677-l679
JournalJapanese Journal of Applied Physics, Part 2: Letters
Volume22
Issue number11
DOIs
Publication statusPublished - 1983 Jan 1
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

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