Large-area growth of in-plane oriented (112̄0) ZnO films by linear cathode magnetron sputtering

Takayuki Kawamoto, Takahiko Yanagitani, Mami Matsukawa, Yoshiaki Watanabe, Yoshikazu Mori, Sho Sasaki, Masatoshi Oba

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

(112̄0) textured ZnO films are good candidates for shear-mode piezoelectric devices. In the previous deposition techniques of these films, there have been two problems related to their practical application. These problems are as follows: (i) highly oriented films can be obtained only in a small area and (ii) the crystallite c-axis of in the films is radially oriented in the substrate plane. To resolve these problems, the sputtering deposition technique using a linear cathode has been proposed. The in-plane and out-of-plane orientations of the films were quantitatively determined by pole figure analysis. As a result, we have demonstrated the formation of in-plane unidirectionally oriented (112̄0) ZnO films over the entire area of 4-in. silicon wafers.

Original languageEnglish
Article number07HD16
JournalJapanese Journal of Applied Physics
Volume49
Issue number7 PART 2
DOIs
Publication statusPublished - 2010 Jul
Externally publishedYes

Fingerprint

Magnetron sputtering
magnetron sputtering
Cathodes
cathodes
Piezoelectric devices
Silicon wafers
Sputtering
Poles
poles
sputtering
wafers
shear
silicon
Substrates

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Large-area growth of in-plane oriented (112̄0) ZnO films by linear cathode magnetron sputtering. / Kawamoto, Takayuki; Yanagitani, Takahiko; Matsukawa, Mami; Watanabe, Yoshiaki; Mori, Yoshikazu; Sasaki, Sho; Oba, Masatoshi.

In: Japanese Journal of Applied Physics, Vol. 49, No. 7 PART 2, 07HD16, 07.2010.

Research output: Contribution to journalArticle

Kawamoto, Takayuki ; Yanagitani, Takahiko ; Matsukawa, Mami ; Watanabe, Yoshiaki ; Mori, Yoshikazu ; Sasaki, Sho ; Oba, Masatoshi. / Large-area growth of in-plane oriented (112̄0) ZnO films by linear cathode magnetron sputtering. In: Japanese Journal of Applied Physics. 2010 ; Vol. 49, No. 7 PART 2.
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