Large area nano pattern fabrication using improved step and repeat UV nanoimprint

Kentaro Ishibashi*, Hiroshi Goto, Takashi Kasahara, Jun Mizuno, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review


Continuous nano structures whose sizes 100 nm line and space were successfully fabricated using two step nanoimprint including oxygen (O 2) plasma irradiation on a silicon substrate in 8 × 56 mm 2 area. Silicon substrate surface condition is important property because fine and continuous pattern forming depend on photo curable resin uniform coating. O 2 plasma irradiation is realized to change into hydrophilic without damage for silicon substrate. The water contact angle was decreased to smaller than 40° after O 2 plasma irradiation. Therefore O 2 plasma irradiation has an advantage of treatment process for continuous nanostructure forming. Our activities on UV nanoimprint lithography are expected to be progress for large area continuous nano structures fabrication.

Original languageEnglish
Pages (from-to)235-238
Number of pages4
JournalJournal of Photopolymer Science and Technology
Issue number2
Publication statusPublished - 2012


  • Large area
  • Nano pattern stitching
  • O plasma irradiation
  • UV Nanoimprint Lithography (UV-NIL)

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry


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