Large-area synthesis of carbon nanofibers by low-power microwave plasma-assisted CVD

Guofang Zhong, Minoru Tachiki, Hitoshi Umezawa, Toyokatsu Fujisaki, Hiroshi Kawarada, Iwao Ohdomari

    Research output: Contribution to journalArticle

    19 Citations (Scopus)

    Abstract

    The use of Low-power microwave plasma-assisted chemical vapor deposition (CVD) for the large-areas synthesis of Carbon Nanotubes was investigated. The results show that at a small microwave power input of 60 W, large-area synthesis of carbon nanofibers can be achieved using remote deposition. The size limitation of the substrate heater caused a growth area increase factor of 25.

    Original languageEnglish
    Pages (from-to)125-128
    Number of pages4
    JournalChemical Vapor Deposition
    Volume10
    Issue number3
    DOIs
    Publication statusPublished - 2004 Jun

    Fingerprint

    Carbon nanofibers
    Chemical vapor deposition
    Microwaves
    vapor deposition
    Plasmas
    microwaves
    Carbon Nanotubes
    carbon
    synthesis
    Carbon nanotubes
    heaters
    Substrates
    carbon nanotubes

    ASJC Scopus subject areas

    • Electrochemistry
    • Process Chemistry and Technology
    • Surfaces, Coatings and Films
    • Surfaces and Interfaces
    • Condensed Matter Physics
    • Electronic, Optical and Magnetic Materials

    Cite this

    Large-area synthesis of carbon nanofibers by low-power microwave plasma-assisted CVD. / Zhong, Guofang; Tachiki, Minoru; Umezawa, Hitoshi; Fujisaki, Toyokatsu; Kawarada, Hiroshi; Ohdomari, Iwao.

    In: Chemical Vapor Deposition, Vol. 10, No. 3, 06.2004, p. 125-128.

    Research output: Contribution to journalArticle

    Zhong, Guofang ; Tachiki, Minoru ; Umezawa, Hitoshi ; Fujisaki, Toyokatsu ; Kawarada, Hiroshi ; Ohdomari, Iwao. / Large-area synthesis of carbon nanofibers by low-power microwave plasma-assisted CVD. In: Chemical Vapor Deposition. 2004 ; Vol. 10, No. 3. pp. 125-128.
    @article{b5b14389df644e66a8e5768648a020b5,
    title = "Large-area synthesis of carbon nanofibers by low-power microwave plasma-assisted CVD",
    abstract = "The use of Low-power microwave plasma-assisted chemical vapor deposition (CVD) for the large-areas synthesis of Carbon Nanotubes was investigated. The results show that at a small microwave power input of 60 W, large-area synthesis of carbon nanofibers can be achieved using remote deposition. The size limitation of the substrate heater caused a growth area increase factor of 25.",
    author = "Guofang Zhong and Minoru Tachiki and Hitoshi Umezawa and Toyokatsu Fujisaki and Hiroshi Kawarada and Iwao Ohdomari",
    year = "2004",
    month = "6",
    doi = "10.1002/cvde.200304168",
    language = "English",
    volume = "10",
    pages = "125--128",
    journal = "Chemical Vapor Deposition",
    issn = "0948-1907",
    publisher = "Wiley-VCH Verlag",
    number = "3",

    }

    TY - JOUR

    T1 - Large-area synthesis of carbon nanofibers by low-power microwave plasma-assisted CVD

    AU - Zhong, Guofang

    AU - Tachiki, Minoru

    AU - Umezawa, Hitoshi

    AU - Fujisaki, Toyokatsu

    AU - Kawarada, Hiroshi

    AU - Ohdomari, Iwao

    PY - 2004/6

    Y1 - 2004/6

    N2 - The use of Low-power microwave plasma-assisted chemical vapor deposition (CVD) for the large-areas synthesis of Carbon Nanotubes was investigated. The results show that at a small microwave power input of 60 W, large-area synthesis of carbon nanofibers can be achieved using remote deposition. The size limitation of the substrate heater caused a growth area increase factor of 25.

    AB - The use of Low-power microwave plasma-assisted chemical vapor deposition (CVD) for the large-areas synthesis of Carbon Nanotubes was investigated. The results show that at a small microwave power input of 60 W, large-area synthesis of carbon nanofibers can be achieved using remote deposition. The size limitation of the substrate heater caused a growth area increase factor of 25.

    UR - http://www.scopus.com/inward/record.url?scp=3142758735&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=3142758735&partnerID=8YFLogxK

    U2 - 10.1002/cvde.200304168

    DO - 10.1002/cvde.200304168

    M3 - Article

    AN - SCOPUS:3142758735

    VL - 10

    SP - 125

    EP - 128

    JO - Chemical Vapor Deposition

    JF - Chemical Vapor Deposition

    SN - 0948-1907

    IS - 3

    ER -