Large-scale atmospheric step-and-repeat UV nanoimprinting

Kentaro Ishibashi, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

Research output: Contribution to journalArticle

Abstract

Step-and-repeat UV nanoimprinting for large-scale nanostructure fabrication under atmospheric pressure was realized using high-viscosity photocurable resin and a simple nanoimprinting system. In step-and-repeat UV nanoimprinting under atmospheric pressure using low-viscosity resin, large-scale nanostructure fabrication is very difficult, due to bubble defects and nonuniformity of the residual layer. To minimize bubble defects and nonuniformity of the residual layer, we focused on the damping effects of photocurable resin viscosity. Fabrication of 165 dies was successfully demonstrated in a 130 × 130 mm 2 area on an 8 in silicon substrate by step-and-repeat UV nanoimprinting under atmospheric pressure using high-viscosity photocurable resin. Nanostructures with widths and spacing patterns from 80 nm to 3 μm and 200 nm depth were formed using a quartz mold. Bubble defects were not observed, and residual layer uniformity was within 30 nm ±10. This study reports on simple step-and-repeat UV nanoimprinting under atmospheric pressure using high-viscosity photocurable resin, as a very widely available method for large-scale mass production of nanostructures.

Original languageEnglish
Article number103439
JournalJournal of Nanotechnology
DOIs
Publication statusPublished - 2012

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Resins
Atmospheric pressure
Viscosity
Nanostructures
Fabrication
Defects
Quartz
Silicon
Damping
Substrates

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Large-scale atmospheric step-and-repeat UV nanoimprinting. / Ishibashi, Kentaro; Goto, Hiroshi; Mizuno, Jun; Shoji, Shuichi.

In: Journal of Nanotechnology, 2012.

Research output: Contribution to journalArticle

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