Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures

Nobuya Hiroshiba, Jonathan P. Hill, Ryoma Hayakawa, Katsuhiko Ariga, Kiyoto Matsuishi, Yutaka Wakayama

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3 Citations (Scopus)

Abstract

We demonstrate a technique for growing fine molecular films on a monolayer scale. We achieve layer-by-layer growth under thermally equilibrium condition by precisely controlling the conditions of an ultra-slow deposition technique. This technique is applicable to various kinds of p-type and n-type organic semiconductors and makes it possible to form a hetero-molecular interface (p-n junction) with molecular level flatness. The technique was used to produce a molecular superlattice, which enables the well-controlled design of energy level alignments in organic semiconductors.

Original languageEnglish
Pages (from-to)74-77
Number of pages4
JournalThin Solid Films
Volume554
DOIs
Publication statusPublished - 2014 Mar 3
Externally publishedYes

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Keywords

  • AFM
  • Hetero interface
  • Hot-wall deposition
  • Molecular layers
  • Super lattice
  • X-ray reflection

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry
  • Metals and Alloys
  • Surfaces, Coatings and Films
  • Surfaces and Interfaces

Cite this

Hiroshiba, N., Hill, J. P., Hayakawa, R., Ariga, K., Matsuishi, K., & Wakayama, Y. (2014). Layer-by-layer growth of precisely controlled hetero-molecular multi-layers and superlattice structures. Thin Solid Films, 554, 74-77. https://doi.org/10.1016/j.tsf.2013.03.082