Lithography Experiments using Synchrotron Radiation from ETL Storage Ring

Koichiro Hoh, Masahiro Hirata, Nobufumi Atoda, Hiroshi Tanino, Shingo Ichimura, Hideo Onuki

Research output: Contribution to journal › Article

Original language	English
Number of pages	1
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	22pt1
Issue number	4
DOIs	https://doi.org/10.1143/jjap.22.765
Publication status	Published - 1983

Cite this

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title = "Lithography Experiments using Synchrotron Radiation from ETL Storage Ring",

author = "Koichiro Hoh and Masahiro Hirata and Nobufumi Atoda and Hiroshi Tanino and Shingo Ichimura and Hideo Onuki",

year = "1983",

doi = "10.1143/jjap.22.765",

language = "English",

volume = "22pt1",

journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "4",

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T1 - Lithography Experiments using Synchrotron Radiation from ETL Storage Ring

AU - Hoh, Koichiro

AU - Hirata, Masahiro

AU - Atoda, Nobufumi

AU - Tanino, Hiroshi

AU - Ichimura, Shingo

AU - Onuki, Hideo

PY - 1983

Y1 - 1983

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DO - 10.1143/jjap.22.765

M3 - Article

AN - SCOPUS:85024276754

VL - 22pt1

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

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ER -