Low-energy ion-beam-induced epitaxial crystallization of GaAs

Naoto Kobayashi, Masataka Hasegawa, Nobuyuki Hayashi

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Properties of the ion-beam-induced epitaxial crystallization (IBIEC) of thin layers of amorphous GaAs with a thickness of about 110 nm formed by As ion implantation have been investigated by using low-energy Ar and Kr ions with their projected ranges within the amorphous layer thickness. Recrystallization of the amorphous layer due to bombardments of Ar ions with energies higher than 60 keV and Kr ions with those higher than 110 keV was observed to proceed up to the sample surface in a layer-by-layer growth manner with residual defects remaining in the recrystallized layer. After eliminating the sputtering effect, regrowth rates per ion fluence were observed to have pseudo-linear dependence on incident ion energy whereas regrowth rates per nuclear energy deposition density showed to vary strongly as a function of incident ion energy. Present results suggest a crucial role of defect formation and its migration in the amorphous layer in the IBIEC.

Original languageEnglish
Pages (from-to)790-794
Number of pages5
JournalNuclear Inst. and Methods in Physics Research, B
Volume80-81
Issue numberPART 2
DOIs
Publication statusPublished - 1993
Externally publishedYes

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Crystallization
Ion beams
ion beams
Ions
crystallization
ions
energy
Defects
Ion implantation
Nuclear energy
defects
Sputtering
nuclear energy
gallium arsenide
ion implantation
bombardment
fluence
sputtering

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Instrumentation
  • Surfaces and Interfaces

Cite this

Low-energy ion-beam-induced epitaxial crystallization of GaAs. / Kobayashi, Naoto; Hasegawa, Masataka; Hayashi, Nobuyuki.

In: Nuclear Inst. and Methods in Physics Research, B, Vol. 80-81, No. PART 2, 1993, p. 790-794.

Research output: Contribution to journalArticle

Kobayashi, Naoto ; Hasegawa, Masataka ; Hayashi, Nobuyuki. / Low-energy ion-beam-induced epitaxial crystallization of GaAs. In: Nuclear Inst. and Methods in Physics Research, B. 1993 ; Vol. 80-81, No. PART 2. pp. 790-794.
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