Low pressure CVD for wide area diamond film deposition at low temperature

Akio Hiraki, Hiroshi Kawarada, Jin Wei, Jing Sheng Ma, Jun ichi Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

We have applied magneto-microwave plasma to be successful, for the first time, in deposition of diamond at far lower pressure than the conventional high pressure plasma CVD. The important point of the low pressure plasma deposition system is to set the electron cyclotron resonance (ECR) condition (875 G in the case of a 2.45 GHz microwave) at the deposition area. The high density plasma (above 1×10 11 /cm 3) necessary for high quality diamond formation has been obtained by the effective microwave absorption near the magnetic field satisfying the ECR condition. The plasma is quite uniform at the discharge area (160 mm in diameter) and uniform diamond films with high quality have been obtained. From the investigation of diamond formation from 50 Torr to 10 -2 Torr in the same deposition system, it is definite that the lower pressure lowers the formation temperature of diamond to 500°C and the effective species for diamond formation are low energy radicals.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsAlbert Feldman, Sandor Holly
PublisherPubl by Int Soc for Optical Engineering
Pages73-80
Number of pages8
Volume1325
Publication statusPublished - 1990
Externally publishedYes
EventDiamond Optics III - San Diego, CA, USA
Duration: 1990 Jul 91990 Jul 11

Other

OtherDiamond Optics III
CitySan Diego, CA, USA
Period90/7/990/7/11

Fingerprint

Diamond films
diamond films
Chemical vapor deposition
Diamonds
low pressure
diamonds
vapor deposition
Electron cyclotron resonance
Microwaves
electron cyclotron resonance
Temperature
Plasma CVD
Plasmas
microwaves
Plasma deposition
Plasma density
microwave absorption
plasma density
Magnetic fields
magnetic fields

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Hiraki, A., Kawarada, H., Wei, J., Ma, J. S., & Suzuki, J. I. (1990). Low pressure CVD for wide area diamond film deposition at low temperature. In A. Feldman, & S. Holly (Eds.), Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1325, pp. 73-80). Publ by Int Soc for Optical Engineering.

Low pressure CVD for wide area diamond film deposition at low temperature. / Hiraki, Akio; Kawarada, Hiroshi; Wei, Jin; Ma, Jing Sheng; Suzuki, Jun ichi.

Proceedings of SPIE - The International Society for Optical Engineering. ed. / Albert Feldman; Sandor Holly. Vol. 1325 Publ by Int Soc for Optical Engineering, 1990. p. 73-80.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Hiraki, A, Kawarada, H, Wei, J, Ma, JS & Suzuki, JI 1990, Low pressure CVD for wide area diamond film deposition at low temperature. in A Feldman & S Holly (eds), Proceedings of SPIE - The International Society for Optical Engineering. vol. 1325, Publ by Int Soc for Optical Engineering, pp. 73-80, Diamond Optics III, San Diego, CA, USA, 90/7/9.
Hiraki A, Kawarada H, Wei J, Ma JS, Suzuki JI. Low pressure CVD for wide area diamond film deposition at low temperature. In Feldman A, Holly S, editors, Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1325. Publ by Int Soc for Optical Engineering. 1990. p. 73-80
Hiraki, Akio ; Kawarada, Hiroshi ; Wei, Jin ; Ma, Jing Sheng ; Suzuki, Jun ichi. / Low pressure CVD for wide area diamond film deposition at low temperature. Proceedings of SPIE - The International Society for Optical Engineering. editor / Albert Feldman ; Sandor Holly. Vol. 1325 Publ by Int Soc for Optical Engineering, 1990. pp. 73-80
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