Low-pressure diamond nuclation and growth on cu substrate

Shin Ichi Ojika, Satoshi Yamashita, Kazuhiro Kataoka, Takefumi Ishikura, Akira Yamaguchi, Hiroshi Kawarada

    Research output: Contribution to journalArticle

    1 Citation (Scopus)

    Abstract

    We present a new technique for providing nuclei for diamond formation on nondiamond substrates and its application to the growth of diamond on a Cu substrate by chemical vapor deposition (CVD). This is a predeposition process in which the substrate is immersed in á CH4/H2 plasma formed by electron cyclotron resonance at a low pressure (0.1 Torr). The technique provides possibilities of nucléation over an increased area at temperatures lower (about 500°C) than usual, as well as improved process controllability. The grown diamonds on Cu exhibit a morphology significantly different from that of diamonds grown on Si.

    Original languageEnglish
    Pages (from-to)193-199
    Number of pages7
    JournalJapanese Journal of Applied Physics
    Volume32
    Issue number2 A
    DOIs
    Publication statusPublished - 1993

    Fingerprint

    Diamonds
    low pressure
    diamonds
    Substrates
    Electron cyclotron resonance
    controllability
    electron cyclotron resonance
    Controllability
    Chemical vapor deposition
    vapor deposition
    Plasmas
    nuclei
    Temperature

    Keywords

    • Amorphous carbon
    • Copper
    • Crystal growth
    • CVD
    • Diamond
    • ECR plasma
    • Lowpressure
    • Nucl;ation

    ASJC Scopus subject areas

    • Engineering(all)
    • Physics and Astronomy(all)

    Cite this

    Ojika, S. I., Yamashita, S., Kataoka, K., Ishikura, T., Yamaguchi, A., & Kawarada, H. (1993). Low-pressure diamond nuclation and growth on cu substrate. Japanese Journal of Applied Physics, 32(2 A), 193-199. https://doi.org/10.1143/JJAP.32.L200

    Low-pressure diamond nuclation and growth on cu substrate. / Ojika, Shin Ichi; Yamashita, Satoshi; Kataoka, Kazuhiro; Ishikura, Takefumi; Yamaguchi, Akira; Kawarada, Hiroshi.

    In: Japanese Journal of Applied Physics, Vol. 32, No. 2 A, 1993, p. 193-199.

    Research output: Contribution to journalArticle

    Ojika, SI, Yamashita, S, Kataoka, K, Ishikura, T, Yamaguchi, A & Kawarada, H 1993, 'Low-pressure diamond nuclation and growth on cu substrate', Japanese Journal of Applied Physics, vol. 32, no. 2 A, pp. 193-199. https://doi.org/10.1143/JJAP.32.L200
    Ojika, Shin Ichi ; Yamashita, Satoshi ; Kataoka, Kazuhiro ; Ishikura, Takefumi ; Yamaguchi, Akira ; Kawarada, Hiroshi. / Low-pressure diamond nuclation and growth on cu substrate. In: Japanese Journal of Applied Physics. 1993 ; Vol. 32, No. 2 A. pp. 193-199.
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