Low temperature diamond film fabrication using magneto-active plasma CVD

M. Yuasa, O. Arakaki, J. S. Ma, A. Hiraki, Hiroshi Kawarada

    Research output: Contribution to journalArticle

    30 Citations (Scopus)

    Abstract

    Using magneto-active plasma CVD, diamond films have been fabricated at 0.01 torr with a substrate temperature of about 400°C. From the viewpoint of increasing plasma density, a gas mixture, CH3OH (H2 + He), obtained by adding a helium to a usually-used gas mixture CH3OH H2, has been employed in this study. For a constant CH3OH concentration (30%), microcrystalline diamond films of good quality can be obtained at a ratio of He (H2 + He) up to 50%, and the growth rate increases with an increase in the ratio. When He (H2 + He) is higher than 50%, graphite appears in the film because of the heavy bombardment on the diamond surface by the accelerated helium species in the plasma at low pressure (0.01 torr).

    Original languageEnglish
    Pages (from-to)168-174
    Number of pages7
    JournalDiamond and Related Materials
    Volume1
    Issue number2-4
    DOIs
    Publication statusPublished - 1992 Mar 25

    Fingerprint

    Plasma CVD
    Helium
    Diamond films
    diamond films
    Gas mixtures
    gas mixtures
    helium
    vapor deposition
    Fabrication
    fabrication
    Diamond
    Graphite
    Plasma density
    plasma density
    bombardment
    Diamonds
    low pressure
    graphite
    diamonds
    Plasmas

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Materials Chemistry
    • Surfaces, Coatings and Films
    • Surfaces and Interfaces

    Cite this

    Low temperature diamond film fabrication using magneto-active plasma CVD. / Yuasa, M.; Arakaki, O.; Ma, J. S.; Hiraki, A.; Kawarada, Hiroshi.

    In: Diamond and Related Materials, Vol. 1, No. 2-4, 25.03.1992, p. 168-174.

    Research output: Contribution to journalArticle

    Yuasa, M. ; Arakaki, O. ; Ma, J. S. ; Hiraki, A. ; Kawarada, Hiroshi. / Low temperature diamond film fabrication using magneto-active plasma CVD. In: Diamond and Related Materials. 1992 ; Vol. 1, No. 2-4. pp. 168-174.
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