Low temperature synthesis of extremely dense and vertically aligned single-walled carbon nanotubes

Guofang Zhong, Takayuki Iwasaki, Kotaro Honda, Yukio Furukawa, Iwao Ohdomari, Hiroshi Kawarada

Research output: Contribution to journalArticlepeer-review

134 Citations (Scopus)

Abstract

A novel point-arc microwave plasma chemical vapor deposition (CVD) apparatus was employed to grow single-walled carbon nanotubes (SWNTs) on Si substrates coated with a sandwich-like nano-layer structure of 0.7 nm Al 2O3 (top)/0.5nm Fe/ 5-70 nm Al2O3 by conventional high frequency sputtering. The growth of extremely dense and vertically aligned SWNTs with an almost constant growth rate of 270 μm/h within 40 min at a temperature as low as 600°C was demonstrated for the first time. The volume density of the as-grown SWNT films is as higher as 66kg/m3.

Original languageEnglish
Pages (from-to)1558-1561
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume44
Issue number4 A
DOIs
Publication statusPublished - 2005 Apr

Keywords

  • Catalyst
  • Chemical vapor deposition
  • Low-temperature deposition
  • Point-arc microwave plasma
  • Single-walled carbon nanotubes
  • Vertical alignment

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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