Low temperature synthesis of extremely dense and vertically aligned single-walled carbon nanotubes

Guofang Zhong; Takayuki Iwasaki; Kotaro Honda; Yukio Furukawa; Iwao Ohdomari; Hiroshi Kawarada

doi:10.1143/JJAP.44.1558

Low temperature synthesis of extremely dense and vertically aligned single-walled carbon nanotubes

Guofang Zhong^*, Takayuki Iwasaki, Kotaro Honda, Yukio Furukawa, Iwao Ohdomari, Hiroshi Kawarada

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

136 Citations (Scopus)

Abstract

A novel point-arc microwave plasma chemical vapor deposition (CVD) apparatus was employed to grow single-walled carbon nanotubes (SWNTs) on Si substrates coated with a sandwich-like nano-layer structure of 0.7 nm Al ₂O₃ (top)/0.5nm Fe/ 5-70 nm Al₂O₃ by conventional high frequency sputtering. The growth of extremely dense and vertically aligned SWNTs with an almost constant growth rate of 270 μm/h within 40 min at a temperature as low as 600°C was demonstrated for the first time. The volume density of the as-grown SWNT films is as higher as 66kg/m³.

Original language	English
Pages (from-to)	1558-1561
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	44
Issue number	4 A
DOIs	https://doi.org/10.1143/JJAP.44.1558
Publication status	Published - 2005 Apr

Keywords

Catalyst
Chemical vapor deposition
Low-temperature deposition
Point-arc microwave plasma
Single-walled carbon nanotubes
Vertical alignment

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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10.1143/JJAP.44.1558

Cite this

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abstract = "A novel point-arc microwave plasma chemical vapor deposition (CVD) apparatus was employed to grow single-walled carbon nanotubes (SWNTs) on Si substrates coated with a sandwich-like nano-layer structure of 0.7 nm Al 2O3 (top)/0.5nm Fe/ 5-70 nm Al2O3 by conventional high frequency sputtering. The growth of extremely dense and vertically aligned SWNTs with an almost constant growth rate of 270 μm/h within 40 min at a temperature as low as 600°C was demonstrated for the first time. The volume density of the as-grown SWNT films is as higher as 66kg/m3.",

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AU - Iwasaki, Takayuki

AU - Honda, Kotaro

AU - Furukawa, Yukio

AU - Ohdomari, Iwao

AU - Kawarada, Hiroshi

PY - 2005/4

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KW - Point-arc microwave plasma

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Low temperature synthesis of extremely dense and vertically aligned single-walled carbon nanotubes

Abstract

Keywords

ASJC Scopus subject areas

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