Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen

K. Tsutsumi; H. Terakado; M. Enami; M. Kobayashi

Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen

K. Tsutsumi, H. Terakado, M. Enami, M. Kobayashi^*

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Abstract

The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.

Original language	English
Pages (from-to)	1959-1962
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	4
Publication status	Published - 2003 Jul 1

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

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title = "Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen",

abstract = "The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.",

author = "K. Tsutsumi and H. Terakado and M. Enami and M. Kobayashi",

year = "2003",

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T1 - Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen

AU - Tsutsumi, K.

AU - Terakado, H.

AU - Enami, M.

AU - Kobayashi, M.

PY - 2003/7/1

Y1 - 2003/7/1

N2 - The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.

AB - The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.

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M3 - Article

AN - SCOPUS:0141681059

SN - 1071-1023

VL - 21

SP - 1959

EP - 1962

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 4

ER -

Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen

Abstract

ASJC Scopus subject areas

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