Low temperature treatment of the (001) ZnTe substrate surface with the assist of atomic hydrogen

K. Tsutsumi, H. Terakado, M. Enami, M. Kobayashi

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

The use of atomic hydrogen for the low temperature treatment of ZnTe substrate surface was discussed. The hydrogen treatment at 100°C removed the surface oxide of the compound prior to its nucleation. The reconstructed surface was achieved at 230°C through annealing and the nucleation was also confirmed.

Original languageEnglish
Pages (from-to)1959-1962
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number4
Publication statusPublished - 2003 Jul 1

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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