Low-voltage organic field-effect transistors with a gate insulator of Ta2O5 formed by sputtering

Heisuke Sakai, Yukio Furukawa, Eiichi Fujiwara, Hirokazu Tada

    Research output: Contribution to journalArticle

    16 Citations (Scopus)

    Abstract

    The Ta2O5 film prepared on silicon by RF sputtering has been used as a gate insulator for the top-contact field-effect transistors fabricated with poly(2-methoxy-5-(2′-ethylhexyloxy)-1,4-phenylenevinylene) (MEH-PPV) or pentacene. Good transistor characteristics have been obtained with saturation at low drive voltages (about -3 V) and with hole mobilities of 5.2 × 10-4 cm2/Vs (MEH-PPV) and 0.8 cm2/Vs (pentacene).

    Original languageEnglish
    Pages (from-to)1172-1173
    Number of pages2
    JournalChemistry Letters
    Volume33
    Issue number9
    DOIs
    Publication statusPublished - 2004 Sep 5

    Fingerprint

    Organic field effect transistors
    Sputtering
    Hole mobility
    Electric potential
    Silicon
    Field effect transistors
    Transistors
    pentacene
    poly(2-methoxy-5-(2'-ethylhexyloxy)-p-phenylenevinylene)

    ASJC Scopus subject areas

    • Chemistry(all)

    Cite this

    Low-voltage organic field-effect transistors with a gate insulator of Ta2O5 formed by sputtering. / Sakai, Heisuke; Furukawa, Yukio; Fujiwara, Eiichi; Tada, Hirokazu.

    In: Chemistry Letters, Vol. 33, No. 9, 05.09.2004, p. 1172-1173.

    Research output: Contribution to journalArticle

    Sakai, Heisuke ; Furukawa, Yukio ; Fujiwara, Eiichi ; Tada, Hirokazu. / Low-voltage organic field-effect transistors with a gate insulator of Ta2O5 formed by sputtering. In: Chemistry Letters. 2004 ; Vol. 33, No. 9. pp. 1172-1173.
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