Measurement of outgassing characteristics from a vacuum chamber fabricated for pressure calibration in UHV/XHV region

Shingo Ichimura, Kiyohide Kokubun, Masahiro Hirata, Sonoko Tsukahara, Kzuya Saito, Yoshinao Ikeda

Research output: Contribution to journalConference article

13 Citations (Scopus)


The construction of a new vacuum system fabricated for pressure calibration in UHV/XHV region is explained together with the measurement of outgassing rate from an XHV chamber used in the system. The outgassing rate was measured using a test chamber by a throughput method after each treatment of the chamber surface such as electrolytic polishing, pre-baking in vacuum, and TiN coating. It was found that the outgassing rate of 3.7 × 10-9 Pa m s-1 after electrolytical polishing could be reduced to 1.0 × 10-13 Pa m s-1 after pre-baking twice followed by TiN coating. The outgassing rate was also measured by the pressure rise method using the whole XHV chamber, and the result was compared with that obtained with the test chamber.

Original languageEnglish
Pages (from-to)291-294
Number of pages4
Issue number1-2
Publication statusPublished - 1999 May
EventProceedings of the 1998 14th International Vaccum Congress 10th International Conference on Solid Surfaces 5th International Conference on Nanometre-Scale Science and Technology 10th International Conference on Quantitative Surface Analysis - Birmingham, GBR
Duration: 1998 Aug 311998 Sep 4


ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

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