Mechanism of positronium formation in mixtures of fluorinated benzenes and n-Hexane

Zhang Zhicheng, Yasuo Ito, Masakazu Washio, Yoneho Tabata

Research output: Contribution to journalArticle

Abstract

Positrinium yield (I3) in binary mixturesof benzene derivatives(p-difluorobenzene 1,2,4,5-tetrafluorobenzene, pentafluorobenzene, perfluorobenzene and p-xylene) in n-hexane has been measured. As additives all of the aromatic compounds have been found to enhance Ps yield in n-hexane, but the effect was unexpectedly smaller for 1,2,4,5-C6H2F4. It is proposed that there are at least three processes which lead to the enhancement: anti-recombination by scavenging excess electrons, anti-recombination by scavenging positive holes, and electron abstraction from excited molecular states. Addition of a small amount of n-hexane in the fluorinated benzenes resultedin a decrease in the Ps yield to a different degree which strongly depended on the number of flourine atoms substituted. Discussion is made on the Ps formation mechanism taking into account possible role of excited molecular states.

Original languageEnglish
Pages (from-to)47-50
Number of pages4
JournalInternational Journal of Radiation Applications and Instrumentation. Part
Volume30
Issue number1
DOIs
Publication statusPublished - 1987
Externally publishedYes

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scavenging
positronium
benzene
aromatic compounds
xylene
electrons
augmentation
atoms

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Mechanism of positronium formation in mixtures of fluorinated benzenes and n-Hexane. / Zhicheng, Zhang; Ito, Yasuo; Washio, Masakazu; Tabata, Yoneho.

In: International Journal of Radiation Applications and Instrumentation. Part, Vol. 30, No. 1, 1987, p. 47-50.

Research output: Contribution to journalArticle

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