Membrane sieve using stoichiometric and stress-reduced SiN/SiO/SiN multilayer films and applications to plasma separation

Dae Sik Lee, Yo Han Choi, Mun Yeon Jun, Yong Duk Han, Hyun C. Yoon, Shuichi Shoji

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    We have proposed a stoichiometric and stress-reduced silicon nitride/silicon oxide/silicon nitride (N/O/N) triple-layer membrane sieves. The membrane sieves were designed to be ultra flat and thin, mechanically stress-reduced, and stable in their electrical and chemical properties. All insulating materials are deposited stoichiometrically by a low pressure chemical vapor deposition (LPCVD) system. The SiN/SiO/SiN membranes with a thickness of 0.4 mm have pores with diameters of 0.6-2 mm. The device is easily fabricated on a 6' silicon wafer with full compatibility with CMOS processes. To see the separation ability of blood plasma, an agarose gel matrix was attached to the sieves for improving the speed, which can be delayed by clogging. We could separate about 1 mL of plasma from 5 mL of human whole blood. We believes that our device can be applicable for the cell-based biosensors or analysis systems in analytical chemistry and bioseparation system.

    Original languageEnglish
    Title of host publicationProceedings of IEEE Sensors
    DOIs
    Publication statusPublished - 2012
    Event11th IEEE SENSORS 2012 Conference - Taipei
    Duration: 2012 Oct 282012 Oct 31

    Other

    Other11th IEEE SENSORS 2012 Conference
    CityTaipei
    Period12/10/2812/10/31

    Fingerprint

    Sieves
    Multilayer films
    Membranes
    Silicon nitride
    Plasmas
    Blood
    Low pressure chemical vapor deposition
    Insulating materials
    Silicon oxides
    Silicon wafers
    Biosensors
    Chemical properties
    Electric properties
    Gels
    Chemical analysis

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering

    Cite this

    Membrane sieve using stoichiometric and stress-reduced SiN/SiO/SiN multilayer films and applications to plasma separation. / Lee, Dae Sik; Choi, Yo Han; Jun, Mun Yeon; Han, Yong Duk; Yoon, Hyun C.; Shoji, Shuichi.

    Proceedings of IEEE Sensors. 2012. 6411404.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Lee, DS, Choi, YH, Jun, MY, Han, YD, Yoon, HC & Shoji, S 2012, Membrane sieve using stoichiometric and stress-reduced SiN/SiO/SiN multilayer films and applications to plasma separation. in Proceedings of IEEE Sensors., 6411404, 11th IEEE SENSORS 2012 Conference, Taipei, 12/10/28. https://doi.org/10.1109/ICSENS.2012.6411404
    Lee, Dae Sik ; Choi, Yo Han ; Jun, Mun Yeon ; Han, Yong Duk ; Yoon, Hyun C. ; Shoji, Shuichi. / Membrane sieve using stoichiometric and stress-reduced SiN/SiO/SiN multilayer films and applications to plasma separation. Proceedings of IEEE Sensors. 2012.
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    AU - Choi, Yo Han

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    AU - Han, Yong Duk

    AU - Yoon, Hyun C.

    AU - Shoji, Shuichi

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