Methane-assisted chemical vapor deposition yielding millimeter-tall single-wall carbon nanotubes of smaller diameter

Zhongming Chen, Dong Young Kim, Kei Hasegawa, Suguru Noda

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

We examined the use of low purity H2 (96 vol % H2 with 4 vol % CH4) in chemical vapor deposition (CVD) using a C 2H2 feedstock, and obtained vertically aligned single-wall carbon nanotubes (VA-SWCNTs) with unexpectedly smaller diameters, larger height, and higher quality compared with those grown using pure H2. During the catalyst annealing, carbon deposited at a small amount from CH 4 on the Fe particles, which kept them small and dense. During CVD, CH4 prevented the Fe particles from coarsening, resulting in an enhanced growth lifetime and suppressed diameter increase of growing SWCNTs. These effects were observed only for CH4, and not for C 2H4 or C2H2. CH4-assisted CVD is an efficient and practical method that uses H2 containing CH4 that is available as a byproduct in chemical factories.

Original languageEnglish
Pages (from-to)6719-6728
Number of pages10
JournalACS Nano
Volume7
Issue number8
DOIs
Publication statusPublished - 2013 Aug 27

Keywords

  • CH addition
  • Fe catalyst nanoparticles
  • H annealing
  • Ostwald ripening
  • chemical vapor deposition
  • single-wall carbon nanotubes

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

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