Micro-photoluminescence study on defects induced by ion microbeam in silica glass

Masato Murai, Hiroyuki Nishikawa, Tomoharu Nakamura, Hirohiko Aiba, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Tomihiro Kamiya

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    We have evaluated the irradiation effects by ion microbeam on silica glass for various ion species by means of a micro-photoluminescence technique. Defect generation and refractive index change were observed for silica at the area of 10 μm × 50 μm scanned by ion microbeam of H+, He+, N4+, C4+, O4+, and Si5+ with energy from 1.7 to 18 MeV. The μ-PL spectroscopy measurements were performed along the side surface perpendicular to the microbeam irradiated surface. Based on the comparison with a result of SRIM (stopping and range of ions in matter) simulation, the defect generation mechanism was discussed in terms of the energy deposition processes due to electronic and nuclear stopping powers. We conclude that the electronic stopping power is responsible for the defect generation at the track of ions. The effect of the nuclear stopping power is also not negligibly small at the end of range.

    Original languageEnglish
    Pages (from-to)537-541
    Number of pages5
    JournalJournal of Non-Crystalline Solids
    Issue number5-7
    Publication statusPublished - 2007 Apr 1



    • Luminescence
    • Optical properties

    ASJC Scopus subject areas

    • Ceramics and Composites
    • Electronic, Optical and Magnetic Materials

    Cite this

    Murai, M., Nishikawa, H., Nakamura, T., Aiba, H., Ohki, Y., Oikawa, M., Sato, T., & Kamiya, T. (2007). Micro-photoluminescence study on defects induced by ion microbeam in silica glass. Journal of Non-Crystalline Solids, 353(5-7), 537-541. https://doi.org/10.1016/j.jnoncrysol.2006.10.053