Microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching

T. Katoh, D. Yamaguchi, Y. Satoh, S. Ikeda, Y. Aoki, Masakazu Washio, Y. Tabata

    Research output: Contribution to journalArticle

    33 Citations (Scopus)

    Abstract

    High aspect-ratio (more than 10) microfabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PTFE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of normal PTFE. The temperature dependence of the etching rates indicated that molecular motion of α-relaxation of samples and structures of smaller fragments (i.e., etched products) produced by irradiation of SR with high dose rate play an important role for SR direct photo-etching. Moreover, we have found that surface modification of PTFE had been proceeding during irradiation of SR to the PTFE at 140°C. The results of differential scanning calorimeter measurements for the modified layers showed that the layers might have crosslinking character.

    Original languageEnglish
    Pages (from-to)24-28
    Number of pages5
    JournalApplied Surface Science
    Volume186
    Issue number1-4
    DOIs
    Publication statusPublished - 2002 Jan 28

    Fingerprint

    polytetrafluoroethylene
    Microfabrication
    Polytetrafluoroethylene
    Synchrotron radiation
    Polytetrafluoroethylenes
    Etching
    synchrotron radiation
    etching
    crosslinking
    Crosslinking
    Irradiation
    irradiation
    high aspect ratio
    Calorimeters
    Dosimetry
    calorimeters
    Surface treatment
    Aspect ratio
    fluence
    Photons

    Keywords

    • Crosslinking
    • High aspect-ratio
    • Microfabrication
    • Photo-etching
    • PTFE
    • Synchrotron radiation

    ASJC Scopus subject areas

    • Physical and Theoretical Chemistry
    • Surfaces, Coatings and Films
    • Condensed Matter Physics

    Cite this

    Microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching. / Katoh, T.; Yamaguchi, D.; Satoh, Y.; Ikeda, S.; Aoki, Y.; Washio, Masakazu; Tabata, Y.

    In: Applied Surface Science, Vol. 186, No. 1-4, 28.01.2002, p. 24-28.

    Research output: Contribution to journalArticle

    Katoh, T. ; Yamaguchi, D. ; Satoh, Y. ; Ikeda, S. ; Aoki, Y. ; Washio, Masakazu ; Tabata, Y. / Microfabrication of crosslinked polytetrafluoroethylene using synchrotron radiation direct photo-etching. In: Applied Surface Science. 2002 ; Vol. 186, No. 1-4. pp. 24-28.
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    abstract = "High aspect-ratio (more than 10) microfabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PTFE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures. The etching rate of the sample with higher crosslinking density resulted in a higher etching rate. This rate was about two times higher than that of normal PTFE. The temperature dependence of the etching rates indicated that molecular motion of α-relaxation of samples and structures of smaller fragments (i.e., etched products) produced by irradiation of SR with high dose rate play an important role for SR direct photo-etching. Moreover, we have found that surface modification of PTFE had been proceeding during irradiation of SR to the PTFE at 140°C. The results of differential scanning calorimeter measurements for the modified layers showed that the layers might have crosslinking character.",
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    AU - Washio, Masakazu

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