Micromachining of crosslinked PTFE by direct photo-etching using synchrotron radiation

Daichi Yamaguchi*, Takanori Katoh, Yasunori Sato, Shigetoshi Ikeda, Masaoki Hirose, Yasushi Aoki, Minoru Iida, Akihiro Oshima, Yoneho Tabata, Masakazu Washio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)


Micromachining of crosslinked PTFE (polytetrafluoroethylene) using synchrotron radiation direct photo-etching method has been demonstrated. High aspect-ratio microfabrication was carried out. The etching rate of crosslinked PTFE was higher than that of non-crosslinked PTFE. Through the etching rate measurements of various samples, it was found that synchrotron radiation etching rate of crosslinked PTFE only depends on the degree of crosslinking, neither molecular weight nor crystallinity. The effect of molecular motion on etching process was discussed from temperature dependence data on etching rate. Furthermore, the surface region of synchrotron radiation irradiated sample was investigated by Fourier transform infrared spectroscopy and the experimental result showed that the modification induced by synchrotron radiation proceeded before desorption.

Original languageEnglish
Pages (from-to)201-212
Number of pages12
JournalMacromolecular Symposia
Publication statusPublished - 2002

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry


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