Micromachining of crosslinked PTFE by direct photo-etching using synchrotron radiation

Daichi Yamaguchi, Takanori Katoh, Yasunori Sato, Shigetoshi Ikeda, Masaoki Hirose, Yasushi Aoki, Minoru Iida, Akihiro Oshima, Yoneho Tabata, Masakazu Washio

    Research output: Contribution to journalArticle

    19 Citations (Scopus)

    Abstract

    Micromachining of crosslinked PTFE (polytetrafluoroethylene) using synchrotron radiation direct photo-etching method has been demonstrated. High aspect-ratio microfabrication was carried out. The etching rate of crosslinked PTFE was higher than that of non-crosslinked PTFE. Through the etching rate measurements of various samples, it was found that synchrotron radiation etching rate of crosslinked PTFE only depends on the degree of crosslinking, neither molecular weight nor crystallinity. The effect of molecular motion on etching process was discussed from temperature dependence data on etching rate. Furthermore, the surface region of synchrotron radiation irradiated sample was investigated by Fourier transform infrared spectroscopy and the experimental result showed that the modification induced by synchrotron radiation proceeded before desorption.

    Original languageEnglish
    Pages (from-to)201-211
    Number of pages11
    JournalMacromolecular Symposia
    Volume181
    DOIs
    Publication statusPublished - 2002

    Fingerprint

    polytetrafluoroethylene
    Micromachining
    Polytetrafluoroethylene
    micromachining
    Synchrotron radiation
    Polytetrafluoroethylenes
    Etching
    synchrotron radiation
    etching
    Microfabrication
    crosslinking
    high aspect ratio
    Crosslinking
    Fourier transform infrared spectroscopy
    Aspect ratio
    molecular weight
    crystallinity
    Desorption
    desorption
    Molecular weight

    ASJC Scopus subject areas

    • Polymers and Plastics
    • Materials Chemistry

    Cite this

    Micromachining of crosslinked PTFE by direct photo-etching using synchrotron radiation. / Yamaguchi, Daichi; Katoh, Takanori; Sato, Yasunori; Ikeda, Shigetoshi; Hirose, Masaoki; Aoki, Yasushi; Iida, Minoru; Oshima, Akihiro; Tabata, Yoneho; Washio, Masakazu.

    In: Macromolecular Symposia, Vol. 181, 2002, p. 201-211.

    Research output: Contribution to journalArticle

    Yamaguchi, Daichi ; Katoh, Takanori ; Sato, Yasunori ; Ikeda, Shigetoshi ; Hirose, Masaoki ; Aoki, Yasushi ; Iida, Minoru ; Oshima, Akihiro ; Tabata, Yoneho ; Washio, Masakazu. / Micromachining of crosslinked PTFE by direct photo-etching using synchrotron radiation. In: Macromolecular Symposia. 2002 ; Vol. 181. pp. 201-211.
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    abstract = "Micromachining of crosslinked PTFE (polytetrafluoroethylene) using synchrotron radiation direct photo-etching method has been demonstrated. High aspect-ratio microfabrication was carried out. The etching rate of crosslinked PTFE was higher than that of non-crosslinked PTFE. Through the etching rate measurements of various samples, it was found that synchrotron radiation etching rate of crosslinked PTFE only depends on the degree of crosslinking, neither molecular weight nor crystallinity. The effect of molecular motion on etching process was discussed from temperature dependence data on etching rate. Furthermore, the surface region of synchrotron radiation irradiated sample was investigated by Fourier transform infrared spectroscopy and the experimental result showed that the modification induced by synchrotron radiation proceeded before desorption.",
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    AU - Yamaguchi, Daichi

    AU - Katoh, Takanori

    AU - Sato, Yasunori

    AU - Ikeda, Shigetoshi

    AU - Hirose, Masaoki

    AU - Aoki, Yasushi

    AU - Iida, Minoru

    AU - Oshima, Akihiro

    AU - Tabata, Yoneho

    AU - Washio, Masakazu

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    AB - Micromachining of crosslinked PTFE (polytetrafluoroethylene) using synchrotron radiation direct photo-etching method has been demonstrated. High aspect-ratio microfabrication was carried out. The etching rate of crosslinked PTFE was higher than that of non-crosslinked PTFE. Through the etching rate measurements of various samples, it was found that synchrotron radiation etching rate of crosslinked PTFE only depends on the degree of crosslinking, neither molecular weight nor crystallinity. The effect of molecular motion on etching process was discussed from temperature dependence data on etching rate. Furthermore, the surface region of synchrotron radiation irradiated sample was investigated by Fourier transform infrared spectroscopy and the experimental result showed that the modification induced by synchrotron radiation proceeded before desorption.

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