Micro/nano fabrication of nanopores formed through SiN

D. S. Lee, H. W. Song, W. I. Jang, Shuichi Shoji, M. Y. Jung

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    2 Citations (Scopus)

    Abstract

    This paper reports a novel micro/nano fabrication method for mass production of low-stressed silicon nitride (SiN) membrane nanopores with the precisely size-controlled 30 nm in diameter using an anisotropic reactive ion etching (ARIE) and nano-imprinting method, while maintaining compatibility with CMOS IC processes. Our method differs from that of Striemer group [1] in the specific membrane material, and Hien group [2] in the specific fabrication protocols. Micromachining protocols facilitate the accomplishing nanostructures to be used for separation of collections of particles. However, membrane fragility and complex fabrication prevents the use of ultrathin membranes for molecular separations. Here, we report a novel, simple and robust micro/nano fabrication method of strong SiN nanosieve membrane with the small, precise, and uniform nano-sized pore structures with a diameter of 30 nm.

    Original languageEnglish
    Title of host publicationProcedia Engineering
    Pages884-887
    Number of pages4
    Volume25
    DOIs
    Publication statusPublished - 2011
    Event25th Eurosensors Conference - Athens, Greece
    Duration: 2011 Sep 42011 Sep 7

    Other

    Other25th Eurosensors Conference
    CountryGreece
    CityAthens
    Period11/9/411/9/7

    Fingerprint

    Nanopores
    Silicon nitride
    Nanotechnology
    Membranes
    Fabrication
    Anisotropic etching
    Reactive ion etching
    Micromachining
    Pore structure
    Nanostructures

    Keywords

    • ARIE
    • E-beam Resist
    • Low stressed SiN
    • Mass production
    • Micro/nano fabrication
    • Nanopore

    ASJC Scopus subject areas

    • Engineering(all)

    Cite this

    Lee, D. S., Song, H. W., Jang, W. I., Shoji, S., & Jung, M. Y. (2011). Micro/nano fabrication of nanopores formed through SiN. In Procedia Engineering (Vol. 25, pp. 884-887) https://doi.org/10.1016/j.proeng.2011.12.217

    Micro/nano fabrication of nanopores formed through SiN. / Lee, D. S.; Song, H. W.; Jang, W. I.; Shoji, Shuichi; Jung, M. Y.

    Procedia Engineering. Vol. 25 2011. p. 884-887.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Lee, DS, Song, HW, Jang, WI, Shoji, S & Jung, MY 2011, Micro/nano fabrication of nanopores formed through SiN. in Procedia Engineering. vol. 25, pp. 884-887, 25th Eurosensors Conference, Athens, Greece, 11/9/4. https://doi.org/10.1016/j.proeng.2011.12.217
    Lee DS, Song HW, Jang WI, Shoji S, Jung MY. Micro/nano fabrication of nanopores formed through SiN. In Procedia Engineering. Vol. 25. 2011. p. 884-887 https://doi.org/10.1016/j.proeng.2011.12.217
    Lee, D. S. ; Song, H. W. ; Jang, W. I. ; Shoji, Shuichi ; Jung, M. Y. / Micro/nano fabrication of nanopores formed through SiN. Procedia Engineering. Vol. 25 2011. pp. 884-887
    @inproceedings{f2e2798a3df44163b31bac4e234d8370,
    title = "Micro/nano fabrication of nanopores formed through SiN",
    abstract = "This paper reports a novel micro/nano fabrication method for mass production of low-stressed silicon nitride (SiN) membrane nanopores with the precisely size-controlled 30 nm in diameter using an anisotropic reactive ion etching (ARIE) and nano-imprinting method, while maintaining compatibility with CMOS IC processes. Our method differs from that of Striemer group [1] in the specific membrane material, and Hien group [2] in the specific fabrication protocols. Micromachining protocols facilitate the accomplishing nanostructures to be used for separation of collections of particles. However, membrane fragility and complex fabrication prevents the use of ultrathin membranes for molecular separations. Here, we report a novel, simple and robust micro/nano fabrication method of strong SiN nanosieve membrane with the small, precise, and uniform nano-sized pore structures with a diameter of 30 nm.",
    keywords = "ARIE, E-beam Resist, Low stressed SiN, Mass production, Micro/nano fabrication, Nanopore",
    author = "Lee, {D. S.} and Song, {H. W.} and Jang, {W. I.} and Shuichi Shoji and Jung, {M. Y.}",
    year = "2011",
    doi = "10.1016/j.proeng.2011.12.217",
    language = "English",
    volume = "25",
    pages = "884--887",
    booktitle = "Procedia Engineering",

    }

    TY - GEN

    T1 - Micro/nano fabrication of nanopores formed through SiN

    AU - Lee, D. S.

    AU - Song, H. W.

    AU - Jang, W. I.

    AU - Shoji, Shuichi

    AU - Jung, M. Y.

    PY - 2011

    Y1 - 2011

    N2 - This paper reports a novel micro/nano fabrication method for mass production of low-stressed silicon nitride (SiN) membrane nanopores with the precisely size-controlled 30 nm in diameter using an anisotropic reactive ion etching (ARIE) and nano-imprinting method, while maintaining compatibility with CMOS IC processes. Our method differs from that of Striemer group [1] in the specific membrane material, and Hien group [2] in the specific fabrication protocols. Micromachining protocols facilitate the accomplishing nanostructures to be used for separation of collections of particles. However, membrane fragility and complex fabrication prevents the use of ultrathin membranes for molecular separations. Here, we report a novel, simple and robust micro/nano fabrication method of strong SiN nanosieve membrane with the small, precise, and uniform nano-sized pore structures with a diameter of 30 nm.

    AB - This paper reports a novel micro/nano fabrication method for mass production of low-stressed silicon nitride (SiN) membrane nanopores with the precisely size-controlled 30 nm in diameter using an anisotropic reactive ion etching (ARIE) and nano-imprinting method, while maintaining compatibility with CMOS IC processes. Our method differs from that of Striemer group [1] in the specific membrane material, and Hien group [2] in the specific fabrication protocols. Micromachining protocols facilitate the accomplishing nanostructures to be used for separation of collections of particles. However, membrane fragility and complex fabrication prevents the use of ultrathin membranes for molecular separations. Here, we report a novel, simple and robust micro/nano fabrication method of strong SiN nanosieve membrane with the small, precise, and uniform nano-sized pore structures with a diameter of 30 nm.

    KW - ARIE

    KW - E-beam Resist

    KW - Low stressed SiN

    KW - Mass production

    KW - Micro/nano fabrication

    KW - Nanopore

    UR - http://www.scopus.com/inward/record.url?scp=84863161621&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=84863161621&partnerID=8YFLogxK

    U2 - 10.1016/j.proeng.2011.12.217

    DO - 10.1016/j.proeng.2011.12.217

    M3 - Conference contribution

    AN - SCOPUS:84863161621

    VL - 25

    SP - 884

    EP - 887

    BT - Procedia Engineering

    ER -