MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

ISAMU KATO, SHIN ICHI WAKANA, SHINJI HARA, HIROSHI KEZUKA

    Research output: Chapter in Book/Report/Conference proceedingChapter

    29 Citations (Scopus)

    Abstract

    THIS STUDY WAS CONCERNED WITH THE DEVELOPMENT OF A PROCESS FOR THE DEPOSITION OF THIN-FILMS FROM A MICROWAVE PLASMA OF SEMICONDUCTOR MATERIALS. A COAXIAL LINE TYPE MICROWAVE CW DISCHARGE WAS USED TO CREATE UNIFORM PLASMAS, AND A-SI FILMS WERE FABRICATED FROM AR GAS CONTAINING 10PSIH//4. THE X-RAY DIFFRACTION PATTERNS SHOWED THAT THE FABRICATED FILMS, WHERE THE MICROWAVE POWER IS LARGE, ARE CRYSTALLIZED AND THE STRUCTURE OF THE OTHER FILMS IS AMORPHOUS. THE RESULTS ARE APPLICABLE TO SOLAR CELL MANUFACTURE.

    Original languageEnglish
    Title of host publicationJpn J Appl Phys Part 2
    Pages470-472
    Number of pages3
    VolumeV 21
    EditionN 8
    Publication statusPublished - 1982 Aug

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    ASJC Scopus subject areas

    • Engineering(all)

    Cite this

    KATO, ISAMU., WAKANA, SHIN. ICHI., HARA, SHINJI., & KEZUKA, HIROSHI. (1982). MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS. In Jpn J Appl Phys Part 2 (N 8 ed., Vol. V 21, pp. 470-472)