MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

ISAMU KATO; SHIN ICHI WAKANA; SHINJI HARA; HIROSHI KEZUKA

MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

ISAMU KATO^*, SHIN ICHI WAKANA, SHINJI HARA, HIROSHI KEZUKA

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Chapter

29 Citations (Scopus)

Abstract

THIS STUDY WAS CONCERNED WITH THE DEVELOPMENT OF A PROCESS FOR THE DEPOSITION OF THIN-FILMS FROM A MICROWAVE PLASMA OF SEMICONDUCTOR MATERIALS. A COAXIAL LINE TYPE MICROWAVE CW DISCHARGE WAS USED TO CREATE UNIFORM PLASMAS, AND A-SI FILMS WERE FABRICATED FROM AR GAS CONTAINING 10PSIH//4. THE X-RAY DIFFRACTION PATTERNS SHOWED THAT THE FABRICATED FILMS, WHERE THE MICROWAVE POWER IS LARGE, ARE CRYSTALLIZED AND THE STRUCTURE OF THE OTHER FILMS IS AMORPHOUS. THE RESULTS ARE APPLICABLE TO SOLAR CELL MANUFACTURE.

Original language	English
Title of host publication	Jpn J Appl Phys Part 2
Pages	470-472
Number of pages	3
Volume	V 21
Edition	N 8
Publication status	Published - 1982 Aug

ASJC Scopus subject areas

Engineering(all)

Cite this

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title = "MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.",

abstract = "THIS STUDY WAS CONCERNED WITH THE DEVELOPMENT OF A PROCESS FOR THE DEPOSITION OF THIN-FILMS FROM A MICROWAVE PLASMA OF SEMICONDUCTOR MATERIALS. A COAXIAL LINE TYPE MICROWAVE CW DISCHARGE WAS USED TO CREATE UNIFORM PLASMAS, AND A-SI FILMS WERE FABRICATED FROM AR GAS CONTAINING 10PSIH//4. THE X-RAY DIFFRACTION PATTERNS SHOWED THAT THE FABRICATED FILMS, WHERE THE MICROWAVE POWER IS LARGE, ARE CRYSTALLIZED AND THE STRUCTURE OF THE OTHER FILMS IS AMORPHOUS. THE RESULTS ARE APPLICABLE TO SOLAR CELL MANUFACTURE.",

author = "ISAMU KATO and WAKANA, {SHIN ICHI} and SHINJI HARA and HIROSHI KEZUKA",

year = "1982",

month = aug,

language = "English",

volume = "V 21",

pages = "470--472",

booktitle = "Jpn J Appl Phys Part 2",

edition = "N 8",

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TY - CHAP

T1 - MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

AU - KATO, ISAMU

AU - WAKANA, SHIN ICHI

AU - HARA, SHINJI

AU - KEZUKA, HIROSHI

PY - 1982/8

Y1 - 1982/8

N2 - THIS STUDY WAS CONCERNED WITH THE DEVELOPMENT OF A PROCESS FOR THE DEPOSITION OF THIN-FILMS FROM A MICROWAVE PLASMA OF SEMICONDUCTOR MATERIALS. A COAXIAL LINE TYPE MICROWAVE CW DISCHARGE WAS USED TO CREATE UNIFORM PLASMAS, AND A-SI FILMS WERE FABRICATED FROM AR GAS CONTAINING 10PSIH//4. THE X-RAY DIFFRACTION PATTERNS SHOWED THAT THE FABRICATED FILMS, WHERE THE MICROWAVE POWER IS LARGE, ARE CRYSTALLIZED AND THE STRUCTURE OF THE OTHER FILMS IS AMORPHOUS. THE RESULTS ARE APPLICABLE TO SOLAR CELL MANUFACTURE.

AB - THIS STUDY WAS CONCERNED WITH THE DEVELOPMENT OF A PROCESS FOR THE DEPOSITION OF THIN-FILMS FROM A MICROWAVE PLASMA OF SEMICONDUCTOR MATERIALS. A COAXIAL LINE TYPE MICROWAVE CW DISCHARGE WAS USED TO CREATE UNIFORM PLASMAS, AND A-SI FILMS WERE FABRICATED FROM AR GAS CONTAINING 10PSIH//4. THE X-RAY DIFFRACTION PATTERNS SHOWED THAT THE FABRICATED FILMS, WHERE THE MICROWAVE POWER IS LARGE, ARE CRYSTALLIZED AND THE STRUCTURE OF THE OTHER FILMS IS AMORPHOUS. THE RESULTS ARE APPLICABLE TO SOLAR CELL MANUFACTURE.

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M3 - Chapter

AN - SCOPUS:0020166767

VL - V 21

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EP - 472

BT - Jpn J Appl Phys Part 2

ER -

MICROWAVE PLASMA CVD SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

Abstract

ASJC Scopus subject areas

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