MICROWAVE PLASMA CVD SYSTEM TO FABRICATE alpha -Si THIN FILMS OUT OF PLASMA.

Isamu Kato, Shin ichi Wakan, Shinji Hara

    Research output: Chapter in Book/Report/Conference proceedingChapter

    31 Citations (Scopus)

    Abstract

    This study is concerned with the development of a system to fabricate thin films by a microwave plasma chemical vapour deposition method while keeping the substrate out of the discharge plasma. Si thin films are fabricated in a deposition region using an improved coaxial line type microwave CW discharge tube without a silicon deposition on the discharge tube wall. A very uniform Si thin film has been fabricated over a circle with a 10 cm diameter and the deposition rates are 50 to 400 A/min. The structure of the fabricated films is amorphous and the optical band gap is 1. 8 to 2. 0 eV.

    Original languageEnglish
    Title of host publicationJapanese Journal of Applied Physics, Part 2: Letters
    Volume22
    Edition1
    Publication statusPublished - 1983 Jan

    Fingerprint

    Plasma CVD
    Gas discharge tubes
    Microwaves
    Thin films
    Plasmas
    Optical band gaps
    Amorphous films
    Deposition rates
    Chemical vapor deposition
    Silicon
    Substrates

    ASJC Scopus subject areas

    • Engineering(all)

    Cite this

    Kato, I., Wakan, S. I., & Hara, S. (1983). MICROWAVE PLASMA CVD SYSTEM TO FABRICATE alpha -Si THIN FILMS OUT OF PLASMA. In Japanese Journal of Applied Physics, Part 2: Letters (1 ed., Vol. 22)

    MICROWAVE PLASMA CVD SYSTEM TO FABRICATE alpha -Si THIN FILMS OUT OF PLASMA. / Kato, Isamu; Wakan, Shin ichi; Hara, Shinji.

    Japanese Journal of Applied Physics, Part 2: Letters. Vol. 22 1. ed. 1983.

    Research output: Chapter in Book/Report/Conference proceedingChapter

    Kato, I, Wakan, SI & Hara, S 1983, MICROWAVE PLASMA CVD SYSTEM TO FABRICATE alpha -Si THIN FILMS OUT OF PLASMA. in Japanese Journal of Applied Physics, Part 2: Letters. 1 edn, vol. 22.
    Kato I, Wakan SI, Hara S. MICROWAVE PLASMA CVD SYSTEM TO FABRICATE alpha -Si THIN FILMS OUT OF PLASMA. In Japanese Journal of Applied Physics, Part 2: Letters. 1 ed. Vol. 22. 1983
    Kato, Isamu ; Wakan, Shin ichi ; Hara, Shinji. / MICROWAVE PLASMA CVD SYSTEM TO FABRICATE alpha -Si THIN FILMS OUT OF PLASMA. Japanese Journal of Applied Physics, Part 2: Letters. Vol. 22 1. ed. 1983.
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