MICROWAVE SPUTTERING SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

I. Kato; H. C. Card; K. C. Kao; S. R. Mejia; L. Chow

doi:10.1063/1.1136929

MICROWAVE SPUTTERING SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

I. Kato^*, H. C. Card, K. C. Kao, S. R. Mejia, L. Chow

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

A new microwave-plasma sputtering method is described for the fabrication of thin solid films. One advantage of this method is that the substrate is not exposed to the plasma which can be made very uniform and confined in a predetermined region. It is, therefore, possible to fabricate uniform solid films over a large area and for a wide range of film thicknesses on low melting-point substrates. Amorphous selenium films fabricated on a glass substrate or a polyethylene sheet are found to be very uniform in thickness, structure, and optical constants over a large deposition area.

Original language	English
Pages (from-to)	214-216
Number of pages	3
Journal	Review of Scientific Instruments
Volume	53
Issue number	2
DOIs	https://doi.org/10.1063/1.1136929
Publication status	Published - 1982 Feb

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)
Instrumentation

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10.1063/1.1136929

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title = "MICROWAVE SPUTTERING SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.",

abstract = "A new microwave-plasma sputtering method is described for the fabrication of thin solid films. One advantage of this method is that the substrate is not exposed to the plasma which can be made very uniform and confined in a predetermined region. It is, therefore, possible to fabricate uniform solid films over a large area and for a wide range of film thicknesses on low melting-point substrates. Amorphous selenium films fabricated on a glass substrate or a polyethylene sheet are found to be very uniform in thickness, structure, and optical constants over a large deposition area.",

author = "I. Kato and Card, {H. C.} and Kao, {K. C.} and Mejia, {S. R.} and L. Chow",

year = "1982",

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AU - Card, H. C.

AU - Kao, K. C.

AU - Mejia, S. R.

AU - Chow, L.

PY - 1982/2

Y1 - 1982/2

N2 - A new microwave-plasma sputtering method is described for the fabrication of thin solid films. One advantage of this method is that the substrate is not exposed to the plasma which can be made very uniform and confined in a predetermined region. It is, therefore, possible to fabricate uniform solid films over a large area and for a wide range of film thicknesses on low melting-point substrates. Amorphous selenium films fabricated on a glass substrate or a polyethylene sheet are found to be very uniform in thickness, structure, and optical constants over a large deposition area.

AB - A new microwave-plasma sputtering method is described for the fabrication of thin solid films. One advantage of this method is that the substrate is not exposed to the plasma which can be made very uniform and confined in a predetermined region. It is, therefore, possible to fabricate uniform solid films over a large area and for a wide range of film thicknesses on low melting-point substrates. Amorphous selenium films fabricated on a glass substrate or a polyethylene sheet are found to be very uniform in thickness, structure, and optical constants over a large deposition area.

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IS - 2

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MICROWAVE SPUTTERING SYSTEM FOR THE FABRICATION OF THIN SOLID FILMS.

Abstract

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